Reactive Liquids for Non-Prestonian Chemical Mechanical Polishing of Polysilicon Films von Lagudu, Uma R. K., Korkmaz, Sevim, Gowda, Akshay, Penta, Naresh K., Babu, S. V.

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Cleaning Solutions for Ultrathin Co Barriers for Advanced Technology Nodes von Alety, Sridevi R, Lagudu, Uma R. K., Popuri, R., Patlolla, Raghuveer, Surisetty, Charan V. V. S., Babu, S. V.

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Heterogeneity of Coarse Particles in an Urban Area von Lagudu, Uma Ramesh K, Raja, Suresh, Hopke, Philip K, Chalupa, David C, Utell, Mark J, Casuccio, Gary, Lersch, Traci L, West, Roger R

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Chemical Mechanical Polishing for Extreme Ultraviolet Lithography Mask Substrates von Amanapu, Hari Prasad, Lagudu, Uma Rames, Teki, Ranganath, John-Kadaksham, Arun, Babu, Suryadevara V.

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Development of Post-CMP Cleaners for Better Defect Performance von Tran, Cuong, Zhang, Peng, Sun, Laisheng, Penta, Naresh K., Lagudu, Uma Rames K., Shipp, Devon, Babu, S.V

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패드 컨디셔닝 브러시 von HOBBS TERRY R, LAGUDU UMA RAMES KRISHNA, ALEXANDER STEPHEN R, JAVID SAMAD, LUECK BRIAN W, DWORSHAK JEREMY K

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Tunable polish rates by varying dissolved oxygen content von DANDU P. R. VEERA, LAGUDU UMA RAMES KRISHNA, PENTA NARESH K, SURYADEVARA BABU V

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