Topography simulation for the virtual wafer fab von Cale, Timothy S., Merchant, Tushar P., Borucki, Leonard J., Labun, Andrew H.

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Etching of polysilicon in inductively coupled Cl2 and HBr discharges. I. Experimental characterization of polysilicon profiles von Mahorowala, Arpan P., Sawin, Herbert H., Jones, Richard, Labun, Andrew H.

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Mechanistic feature-scale profile simulation of SiO2 low-pressure chemical vapor deposition by tetraethoxysilane pyrolysis von Labun, Andrew H., Moffat, Harry K., Cale, Timothy S.

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Topography simulation for the virtual wafer fab: Process and materials modeling in IC fabrication von CALE, Timothy S, MERCHANT, Tushar P, BORUCKI, Leonard J, LABUN, Andrew H

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Etching of polysilicon in inductively coupled Cl 2 and HBr discharges. I. Experimental characterization of polysilicon profiles von Mahorowala, Arpan P., Sawin, Herbert H., Jones, Richard, Labun, Andrew H.

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Mechanistic feature-scale profile simulation of SiO{sub 2} low-pressure chemical vapor deposition by tetraethoxysilane pyrolysis von Labun, Andrew H., Moffat, Harry K., Cale, Timothy S.

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Mechanistic feature-scale profile simulation of SiO sub(2) low-pressure chemical vapor deposition by tetraethoxysilane pyrolysis von Labun, Andrew H, Moffat, Harry K, Cale, Timothy S

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Mechanistic feature-scale profile simulation of SiO 2 low-pressure chemical vapor deposition by tetraethoxysilane pyrolysis von Labun, Andrew H., Moffat, Harry K., Cale, Timothy S.

Volltext

Etching of polysilicon in inductively coupled Cl sub(2) and HBr discharges: I. Experimental characterization of polysilicon profiles von Mahorowala, Arpan P, Sawin, Herbert H, Jones, Richard, Labun, Andrew H

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