Exploring the electron density in plasma induced by EUV radiation: I. Experimental study in hydrogen von van der Horst, R M, Beckers, J, Osorio, E A, Astakhov, D I, Goedheer, W J, Lee, C J, Ivanov, V V, Krivtsum, V M, Koshelev, K N, Lopaev, D V, Bijkerk, F, Banine, V Y

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“Virtual IED sensor” at an rf-biased electrode in low-pressure plasma von Bogdanova, M. A., Lopaev, D. V., Zyryanov, S. M., Rakhimov, A. T.

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Surface recombination of oxygen atoms in O2 plasma at increased pressure: I. The recombination probability and phenomenological model of surface processes von Lopaev, D V, Malykhin, E M, Zyryanov, S M

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Influence of internal stress and layer thickness on the formation of hydrogen induced thin film blisters in Mo/Si multilayers von van den Bos, R A J M, Reinink, J, Lopaev, D V, Lee, C J, Benschop, J P H, Bijkerk, F

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Surface recombination of oxygen atoms in O2 plasma at increased pressure: II. Vibrational temperature and surface production of ozone von Lopaev, D V, Malykhin, E M, Zyryanov, S M

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Actinometry of O, N and F atoms von Lopaev, D V, Volynets, A V, Zyryanov, S M, Zotovich, A I, Rakhimov, A T

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Sputtering of amorphous Si by low-energy Ar+, Kr+, and Xe+ ions von Shibanov, D. R., Lopaev, D. V., Zyryanov, S. M., Zotovich, A. I., Maslakov, K. I., Rakhimov, A. T.

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Experimental study of transition from electron beam to rf-power-controlled plasma in DFCCP in argon with additional ionization by an electron beam von Zotovich, A I, Lopaev, D V, Bogdanova, M A, Zyryanov, S M, Rakhimov, A T

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Negative ion destruction by O(3P) atoms and O2(a 1Δg) molecules in an oxygen plasma von Belostotsky, S G, Economou, D J, Lopaev, D V, Rakhimova, T V

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Effect of H atoms and UV wideband radiation on cured low-k OSG films von Lopaev, D V, Zotovich, A I, Zyryanov, S M, Bogdanova, M A, Rakhimova, T V, Mankelevich, Y A, Novikova, N N, Seregin, D S, Vishnevskiy, A S, Vorotilov, K A, Shi, Xiaoping, Baklanov, M R

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Damage to porous SiCOH low-k dielectrics by O, N and F atoms at lowered temperatures von Lopaev, D., Zyryanov, S. M., Zotovich, A., Rakhimova, T., Mankelevich, Yu A., Voronina, E. N.

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Multifold study of volume plasma chemistry in Ar/CF4 and Ar/CHF3 CCP discharges von Proshina, O V, Rakhimova, T V, Zotovich, A I, Lopaev, D V, Zyryanov, S M, Rakhimov, A T

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VUV radiation flux from argon DC magnetron plasma von Pal, A F, Ryabinkin, A N, Serov, A O, Lopaev, D V, Mankelevich, Yu A, Rakhimov, A T, Rakhimova, T V, Baklanov, M R

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Electron energy probability function in plasma controlled by high-energy run-away electrons von Lopaev, D V, Bogdanova, M A, Volynets, A V, Zotovich, A I, Zyryanov, S M

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N2 dissociation and kinetics of N(4S) atoms in nitrogen DC glow discharge von Volynets, A V, Lopaev, D V, Rakhimova, T V, Chukalovsky, A A, Mankelevich, Yu A, Popov, N A, Zotovich, A I, Rakhimov, A T

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Fast quenching of metastable O2(a1Δg) and O2(b1Σg+) molecules by O(3P) atoms at high temperature von Volynets, A V, Lopaev, D V, Rakhimova, T V, Proshina, O V, Chukalovsky, A A, Booth, J P

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Silicon dioxide and low-k material sputtering in dual frequency inductive discharge by argon ions with energies from 16 to 200 eV von Lopaev, D V, Rakhimova, T V, Rakhimov, A T, Zotovich, A I, Zyryanov, S M, Baklanov, M R

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Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen von Astakhov, D I, Goedheer, W J, Lee, C J, Ivanov, V V, Krivtsun, V M, Koshelev, K N, Lopaev, D V, van der Horst, R M, Beckers, J, Osorio, E A, Bijkerk, F

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Volume and surface loss of O(3P) atoms in O2 RF discharge in quartz tube at intermediate pressures (10-100 Torr) von Volynets, A V, Lopaev, D V, Zyryanov, S M, Bogdanova, M A, Rakhimov, A T

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Damage and etching of ultra low-k materials in fluorocarbon plasma at lowered temperatures von Lopaev, D V, Mankelevich, Yu A, Rakhimova, T V, Zotovich, A I, Zyryanov, S M, Baklanov, M R

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