Method of fabricating self-aligned source and drain contacts in a Double gate FET with controlled manufacturing of a thin Si or non-Si channel von PONOMAREV, YOURI V, LOO, JOSINE JOHANNA GERARDA PETRA

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Method of fabricating self-aligned source and drain contacts in a double gate FET with controlled manufacturing of a thin Si or non-Si channel von Ponomarev, Youri V, Loo, Josine Johanna Gerarda Petra

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Method of fabricating self-aligned source and drain contacts in a double gate FET with controlled manufacturing of a thin Si or non-Si channel von LOO JOSINE JOHANNA GERARDA PETRA, PONOMAREV YOURI V

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Method and device to form high quality oxide layers of different thickness in one processing step von LOO JOSINE JOHANNA GERARDA PETRA, SCHAIJK ROBERTUS THEODORUS FRANSISCUS, PONOMAREV YOURI

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Method for fabricating self-aligned source and drain contacts in a double gate FET with controlled manufacturing of a thin Si or non-Si channel von PONOMAREV, YOURI V, LOO, JOSINE JOHANNA GERARDA PETRA

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Method of fabricating self-aligned source and drain contacts in a Double gate FET with controlled manufacturing of a thin Si or non-Si channel von PONOMAREV, YOURI V, LOO, JOSINE JOHANNA GERARDA PETRA

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Method to make markers for double gate SOI processing von PONOMAREV, YOURI V, LOO, JOSINE JOHANNA GERARDA PETRA, LAIDLER, DAVID WILLIAM

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Method to make markers for doublegate SOI processing von PONOMAREV, YOURI V, LOO, JOSINE JOHANNA GERARDA PETRA, LAIDER, DAVID WILLIAM

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Method to make markers for doublegate SOI processing von PONOMAREV, YOURI V, LOO, JOSINE JOHANNA GERARDA PETRA, LAIDER, DAVID WILLIAM

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Method and device to form high quality oxide layers of different thickness in one processing step von LOO JOSINE JOHANNA GERARDA PETRA, SCHAIJK ROBERTUS THEODORUS FRANSISCUS, PONOMAREV YOURI

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Method for fabricating self-aligned source and drain contacts in a double gate fet with controlled manufacturing of a thin Si or non-Si channel von PONOMAREV, YOURI V, LOO, JOSINE JOHANNA GERARDA PETRA

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Method to make markers for double gate SOI processing von PONOMAREV, YOURI V, LOO, JOSINE JOHANNA GERARDA PETRA, LAIDLER, DAVID WILLIAM

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Method and device to form high quality oxide layers of different thickness in one processing step von LOO, JOSINE JOHANNA GERARDA PETRA, SCHAIJK, ROBERTUS THEODORUS FRANSISCUS VAN, PONOMAREV, YOURI

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