Sputter-redeposition method for the fabrication of automatically sealed micro/nanochannel using FIBs von Kim, Heung-Bae, Hobler, Gerhard, Steiger, Andreas, Lugstein, Alois, Bertagnolli, Emmerich, Platzgummer, Elmar, Loeschner, Hans

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PII: S0167-9317(06)00285-1 von Loeschner, Hans

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Projection Charged Particle Nanolithography and Nanopatterning von Loeschner, Hans, Klein, Christof, Platzgummer, Elmar

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Projection Mask-Less Lithography (PML2) von Klein, Christof, Klikovits, Jan, Szikszai, Laszlo, Platzgummer, Elmar, Loeschner, Hans

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Ion multi-beam direct sputtering of Si imprint stamps and simulation of resulting structures von Eder-Kapl, Stefan, Steiger-Thirsfeld, Andreas, Wellenzohn, Markus, Koeck, Anton, Hainberger, Rainer, Loeschner, Hans, Platzgummer, Elmar

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Damascene Process for Controlled Positioning of Magnetic Colloidal Nanocrystals von Chen, Gang, Bodnarchuk, Maryna I., Kovalenko, Maksym V., Springholz, Gunther, Heiss, Wolfgang, Jantsch, Wolfgang, Platzgummer, Elmar, Loeschner, Hans, Schotter, Joerg

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Charged Particle Nanopatterning (CHARPAN) of 2D and 3D masters for flexible replication in Substrate Conformal Imprint Lithography (SCIL) von van Delft, Falco, van de Laar, Robert, Verschuuren, Marc, Platzgummer, Elmar, Loeschner, Hans

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Ueber Sonnenuhren von Loeschner, Hans

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Proceedings of the 31st International Conference on Micro- and Nano-Engineering: 19-22 September 2005, Vienna, Austria von LOESCHNER, Hans

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Characterization of CMOS programmable multi-beam blanking arrays as used for programmable multi-beam projection lithography and resistless nanopatterning von Eder Kapl, Stefan, Loeschner, Hans, Piller, Walter, Witt, Martin, Pilz, Wolfgang, Letzkus, Florian, Jurisch, Michael, Irmscher, Mathias, Platzgummer, Elmar

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Argon ion multibeam nanopatterning of Ni–Cu inserts for injection molding von Koeck, Anton, Bruck, Roman, Wellenzohn, Markus, Hainberger, Rainer, Platzgummer, Elmar, Loeschner, Hans, Joechl, Peter, Eder-Kapl, Stefan, Ebm, Christoph, Czepl, Peter, Kaiblinger, Kurt, Pipelka, Friedrich, Letzkus, Florian, Irmscher, Mathias, Heitkamp, Bernd

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Nanopatterning of Magnetic Disks by Single-Step Ar+ Ion Projection von Dietzel, A., Berger, R., Loeschner, H., Platzgummer, E., Stengl, G., Bruenger, W.H., Letzkus, F.

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MULTI-BEAM TOOL FOR CUTTING PATTERNS von Platzgummer, Elmar, Loeschner, Hans

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Three-dimensional projection mask-less patterning (PMLP) of micro-lenses and cones: Monitoring and modelling of ion multi-beam kinetic sputtering in GaAs von van Delft, Falco C.M.J.M., Ebm, Christoph, Naburgh, Emile P., Platzgummer, Elmar, Loeschner, Hans, Gross, Gerhard

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Ion projection direct structuring for patterning of magnetic media von Dietzel, A., Berger, R., Grimm, H., Bruenger, W.H., Dzionk, C., Letzkus, F., Springer, R., Loeschner, H., Platzgummer, E., Stengl, G., Bandic, Z.Z., Terris, B.D.

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Ion multibeam nanopatterning for photonic applications: Experiments and simulations, including study of precursor gas induced etching and deposition von Ebm, Christoph, Platzgummer, Elmar, Loeschner, Hans, Eder-Kapl, Stefan, Joechl, Peter, Kuemmel, Marco, Reitinger, Ruediger, Hobler, Gerhard, Koeck, Anton, Hainberger, Rainer, Wellenzohn, Markus, Letzkus, Florian, Irmscher, Mathias

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Line edge roughness investigation on chemically amplified resist materials with masked helium ion beam lithography von Eder-Kapl, Stefan, Loeschner, Hans, Zeininger, Michalea, Fallmann, Wolfgang, Kirch, Oliver, Patsis, George P., Constantoudis, V., Gogolides, Evangelos

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MULTI-BEAM TOOL FOR CUTTING PATTERNS von Platzgummer, Elmar, Loeschner, Hans

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Line edge roughness investigation on chemically amplified resist materials with masked helium ion beam lithography von EDER-KAPL, Stefan, LOESCHNER, Hans, ZEININGER, Michalea, FALLMANN, Wolfgang, KIRCH, Oliver, PATSIS, George P, CONSTANTOUDIS, V, GOGOLIDES, Evangelos

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Charged particle nanopatterning von Platzgummer, Elmar, Loeschner, Hans

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