A novel in situ compression method for CFD data based on generative adversarial network von Liu, Yang, Wang, Yueqing, Deng, Liang, Wang, Fang, Liu, Fang, Lu, Yutong, Li, Sikun

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Lithography Hotspot Detection Method Based on Transfer Learning Using Pre-Trained Deep Convolutional Neural Network von Liao, Lufeng, Li, Sikun, Che, Yongqiang, Shi, Weijie, Wang, Xiangzhao

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Wavelet ridge techniques in optical fringe pattern analysis von Li, Sikun, Su, Xianyu, Chen, Wenjing

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Universal calculation formula and calibration method in Fourier transform profilometry von Wen, Yongfu, Li, Sikun, Cheng, Haobo, Su, Xianyu, Zhang, Qican

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Eliminating the zero spectrum in Fourier transform profilometry using empirical mode decomposition von Li, Sikun, Su, Xianyu, Chen, Wenjing, Xiang, Liqun

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Source mask optimization using the covariance matrix adaptation evolution strategy von Chen, Guodong, Li, Sikun, Wang, Xiangzhao

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Rigorous simulation model of double-Ronchi shearing interferometry on lithographic tools von Niu, Zhiyuan, Li, Sikun, Liu, Yang

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Efficient optical proximity correction based on virtual edge and mask pixelation with two-phase sampling von Chen, Guodong, Li, Sikun, Wang, Xiangzhao

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Source mask optimization for extreme-ultraviolet lithography based on thick mask model and social learning particle swarm optimization algorithm von Zhang, Zinan, Li, Sikun, Wang, Xiangzhao, Cheng, Wei, Qi, Yuejing

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Random phase plate designed by the genetic algorithm for decoherence in energy homogenization units of a photolithography illumination system von Liu, Jiahong, Zhang, Fang, Zhang, Pei, Li, Sikun, Huang, Huijie

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Social Network Analysis Layout Algorithm under Ontology Model von Wu, Peng, Li, SiKun

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Equivalence checking between SLM and TLM using coverage directed simulation von HU, Jian, LI, Tun, LI, Sikun

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Optimal defocus selection based on normed Fourier transform for digital fringe pattern profilometry von Kamagara, Abel, Wang, Xiangzhao, Li, Sikun

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Effects and elimination of image grating defocusing on a double-Ronchi shearing interference field von Liu, Yang, Tang, Feng, Li, Sikun, Wang, Xiangzhao

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Fast heuristic-based source mask optimization for EUV lithography using dual edge evolution and partial sampling von Zhang, Zinan, Li, Sikun, Wang, Xiangzhao, Cheng, Wei

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Phase defect characterization using generative adversarial networks for extreme ultraviolet lithography von Zheng, Hang, Li, Sikun, Cheng, Wei, Yuan, Shuai, Wang, Xiangzhao

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Hilbert assisted wavelet transform method of optical fringe pattern phase reconstruction for optical profilometry and interferometry von Li, Sikun, Su, Xianyu, Chen, Wenjing

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Radial period extraction method employing frequency measurement for quantitative collimation testing von Li, Sikun, Wang, Xiangzhao

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Extreme ultraviolet phase defect characterization based on complex amplitudes of the aerial images von Cheng, Wei, Li, Sikun, Wang, Xiangzhao, Zhang, Zinan

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Through-focus EUV multilayer defect compensation considering optical proximity correction von Cheng, Wei, Li, Sikun, Wang, Xiangzhao, Zhang, Zinan

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