Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends von Miikkulainen, Ville, Leskelä, Markku, Ritala, Mikko, Puurunen, Riikka L.

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Substrate-Dependent Area-Selective Atomic Layer Deposition of Noble Metals from Metal β‑Diketonate Precursors von Zhang, Chao, Tois, Eva, Leskelä, Markku, Ritala, Mikko

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Hydrogen activation by 2-boryl-N,N-dialkylanilines: a revision of Piers' ansa-aminoborane von Chernichenko, Konstantin, Nieger, Martin, Leskelä, Markku, Repo, Timo

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Atomic layer deposition of CoF2, NiF2 and HoF3 thin films von Atosuo, Elisa, Mäntymäki, Miia, Pesonen, Leevi, Mizohata, Kenichiro, Hatanpää, Timo, Leskelä, Markku, Ritala, Mikko

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Low temperature atomic layer deposition of noble metals using ozone and molecular hydrogen as reactants von Hämäläinen, Jani, Puukilainen, Esa, Sajavaara, Timo, Ritala, Mikko, Leskelä, Markku

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Charge carrier dynamics in tantalum oxide overlayered and tantalum doped hematite photoanodes von Ruoko, Tero-Petri, Hiltunen, Arto, Iivonen, Tomi, Ulkuniemi, Riina, Lahtonen, Kimmo, Ali-Löytty, Harri, Mizohata, Kenichiro, Valden, Mika, Leskelä, Markku, Tkachenko, Nikolai V.

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Novel materials by atomic layer deposition and molecular layer deposition von Leskelä, Markku, Ritala, Mikko, Nilsen, Ola

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Atomic Layer Deposition of Groups 4 and 5 Transition Metal Oxide Thin Films: Focus on Heteroleptic Precursors von Blanquart, Timothee, Niinistö, Jaakko, Ritala, Mikko, Leskelä, Markku

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Atomic layer deposition of zirconium dioxide from zirconium tetrachloride and ozone von Kukli, Kaupo, Kemell, Marianna, Köykkä, Joel, Mizohata, Kenichiro, Vehkamäki, Marko, Ritala, Mikko, Leskelä, Markku

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Mechanical properties of aluminum, zirconium, hafnium and tantalum oxides and their nanolaminates grown by atomic layer deposition von Jõgiaas, Taivo, Zabels, Roberts, Tamm, Aile, Merisalu, Maido, Hussainova, Irina, Heikkilä, Mikko, Mändar, Hugo, Kukli, Kaupo, Ritala, Mikko, Leskelä, Markku

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History of atomic layer deposition and its relationship with the American Vacuum Society (vol 31, 050818, 2013) von Parsons, Gregory N., Elam, Jeffrey W., George, Steven M., Haukka, Suvi, Jeon, Hyeongtag, (Erwin) Kessels, W. M. M., Leskelae, Markku, Poodt, Paul, Ritala, Mikko, Rossnagel, Steven M.

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Selective oxidation of uronic acids into aldaric acids over gold catalyst von Rautiainen, Sari, Lehtinen, Petra, Chen, Jingjing, Vehkamäki, Marko, Niemelä, Klaus, Leskelä, Markku, Repo, Timo

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Aerobic oxidation of benzylic alcohols with bis(3,5-di- tert-butylsalicylaldimine)copper(II) complexes von Ahmad, Jahir Uddin, Figiel, Pawel J., Räisänen, Minna T., Leskelä, Markku, Repo, Timo

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Bismuth iron oxide thin films using atomic layer deposition of alternating bismuth oxide and iron oxide layers von Puttaswamy, Manjunath, Vehkamäki, Marko, Kukli, Kaupo, Dimri, Mukesh Chandra, Kemell, Marianna, Hatanpää, Timo, Heikkilä, Mikko J., Mizohata, Kenichiro, Stern, Raivo, Ritala, Mikko, Leskelä, Markku

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Mn( ii ) acetate: an efficient and versatile oxidation catalyst for alcohols von Räisänen, Minna T., Al-Hunaiti, Afnan, Atosuo, Elisa, Kemell, Marianna, Leskelä, Markku, Repo, Timo

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Atomic layer deposition process with TiF4 as a precursor for depositing metal fluoride thin films von Pilvi, Tero, Ritala, Mikko, Leskelä, Markku, Bischoff, Martin, Kaiser, Ute, Kaiser, Norbert

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Intramolecular Frustrated Lewis Pair with the Smallest Boryl Site: Reversible H sub(2) Addition and Kinetic Analysis von Chernichenko, Konstantin, Kotai, Bianka, Papai, Imre, Zhivonitko, Vladimir, Nieger, Martin, Leskelae, Markku, Repo, Timo

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Atomic Layer Deposition and Characterization of Bi sub(2)Te sub(3) Thin Films von Sarnet, Tiina, Hatanpaeae, Timo, Puukilainen, Esa, Mattinen, Miika, Vehkamaeki, Marko, Mizohata, Kenichiro, Ritala, Mikko, Leskelae, Markku

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Holmium titanium oxide thin films grown by atomic layer deposition von Kukli, Kaupo, Kemell, Marianna, Dimri, Mukesh Chandra, Puukilainen, Esa, Tamm, Aile, Stern, Raivo, Ritala, Mikko, Leskelä, Markku

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Atomic Layer Deposition of MgF2 Thin Films Using TaF5 as a Novel Fluorine Source von Pilvi, Tero, Puukilainen, Esa, Kreissig, Ulrich, Leskelä, Markku, Ritala, Mikko

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