Atomic Layer Deposition of Noble Metals and Their Oxides von Hämäläinen, Jani, Ritala, Mikko, Leskelä, Markku

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Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends von Miikkulainen, Ville, Leskelä, Markku, Ritala, Mikko, Puurunen, Riikka L.

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Review Article: Atomic layer deposition of optoelectronic materials von Leskelä, Markku, Mattinen, Miika, Ritala, Mikko

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Chiral Molecular Tweezers: Synthesis and Reactivity in Asymmetric Hydrogenation von Lindqvist, Markus, Borre, Katja, Axenov, Kirill, Kótai, Bianka, Nieger, Martin, Leskelä, Markku, Pápai, Imre, Repo, Timo

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A frustrated-Lewis-pair approach to catalytic reduction of alkynes to cis-alkenes von Chernichenko, Konstantin, Madarász, Ádám, Pápai, Imre, Nieger, Martin, Leskelä, Markku, Repo, Timo

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Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronics von Mattinen, Miika, Popov, Georgi, Vehkamäki, Marko, King, Peter J, Mizohata, Kenichiro, Jalkanen, Pasi, Räisänen, Jyrki, Leskelä, Markku, Ritala, Mikko

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Atomic Layer Deposition of 2D Metal Dichalcogenides for Electronics, Catalysis, Energy Storage, and Beyond von Mattinen, Miika, Leskelä, Markku, Ritala, Mikko

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Atomic Layer Deposition and Pulsed Chemical Vapor Deposition of SnI2 and CsSnI3 von Weiß, Alexander, Terletskaia, Mariia, Popov, Georgi, Mizohata, Kenichiro, Leskelä, Markku, Ritala, Mikko, Kemell, Marianna

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Thermal Atomic Layer Deposition of Continuous and Highly Conducting Gold Thin Films von Mäkelä, Maarit, Hatanpää, Timo, Mizohata, Kenichiro, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku

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Atomic Layer Deposition of Metal Tellurides and Selenides Using Alkylsilyl Compounds of Tellurium and Selenium von Pore, Viljami, Hatanpää, Timo, Ritala, Mikko, Leskelä, Markku

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Substrate-Dependent Area-Selective Atomic Layer Deposition of Noble Metals from Metal β‑Diketonate Precursors von Zhang, Chao, Tois, Eva, Leskelä, Markku, Ritala, Mikko

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Molecular Tweezers for Hydrogen: Synthesis, Characterization, and Reactivity von Sumerin, Victor, Schulz, Felix, Atsumi, Michiko, Wang, Cong, Nieger, Martin, Leskelä, Markku, Repo, Timo, Pyykkö, Pekka, Rieger, Bernhard

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Area-Selective Molecular Layer Deposition of Polyimide on Cu through Cu-Catalyzed Formation of a Crystalline Interchain Polyimide von Zhang, Chao, Vehkamäki, Marko, Pietikäinen, Mika, Leskelä, Markku, Ritala, Mikko

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Precursors as enablers of ALD technology: Contributions from University of Helsinki von Hatanpää, Timo, Ritala, Mikko, Leskelä, Markku

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Atomic layer deposition (ALD): from precursors to thin film structures von Leskelä, Markku, Ritala, Mikko

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Highly Active Metal-Free Catalysts for Hydrogenation of Unsaturated Nitrogen-Containing Compounds von Sumerin, Victor, Chernichenko, Konstantin, Nieger, Martin, Leskelä, Markku, Rieger, Bernhard, Repo, Timo

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Atomic Layer Deposition of CsI and CsPbI3 von Weiß, Alexander, Popov, Georgi, Atosuo, Elisa, Vihervaara, Anton, Jalkanen, Pasi, Vehkamäki, Marko, Leskelä, Markku, Ritala, Mikko, Kemell, Marianna

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WO3 photocatalysts: Influence of structure and composition von Szilágyi, Imre M., Fórizs, Balázs, Rosseler, Olivier, Szegedi, Ágnes, Németh, Péter, Király, Péter, Tárkányi, Gábor, Vajna, Balázs, Varga-Josepovits, Katalin, László, Krisztina, Tóth, Attila L., Baranyai, Péter, Leskelä, Markku

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Studies on Thermal Atomic Layer Deposition of Silver Thin Films von Mäkelä, Maarit, Hatanpää, Timo, Mizohata, Kenichiro, Meinander, Kristoffer, Niinistö, Jaakko, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku

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Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges von Leskelä, Markku, Ritala, Mikko

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