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  1. 1
    Method of forming an ohmic layer and method of forming a metal wiring of a semiconductor device using the same

    Method of forming an ohmic layer and method of forming a metal wiring of a semiconductor device using the same von LEE EUN-OK, LEE KI-HAG, PARK MYUNG-BEOM, KIM HYUN-SU, KIM BYUNG-HEE, CHO KYOOUL, CHOI JUNG-SIK, KIM DAE-YONG

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  2. 2
    Fatigue Analysis of Nuclear Welded Structures Considering FSRF Based on NDE

    Fatigue Analysis of Nuclear Welded Structures Considering FSRF Based on NDE von Kim, Jong Sung, Jin, Tae Eun, Youm, Hag Ki

    Veröffentlicht in Key engineering materials

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  3. 3
    METHOD OF MANUFACTURING OHMIC CONTACT LAYER AND METHOD OF MANUFACTURING METAL WIRE OF SEMICONDUCTOR DEVICE USING THE SAME

    METHOD OF MANUFACTURING OHMIC CONTACT LAYER AND METHOD OF MANUFACTURING METAL WIRE OF SEMICONDUCTOR DEVICE USING THE SAME von KIM, BYUNG HEE, KIM, DAE YONG, KIM, HYUN SU, CHOI, JUNG SIK, LEE, EUN OK, CHO, KYOO CHUL, LEE, KI HAG, PARK, MYUNG BEOM

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