Chemical Modification of the Photoluminescence Quenching of Porous Silicon von Lauerhaas, Jeffrey M., Sailor, Michael J.

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Selective Nitride Etching with Phosphoric and Sulfuric Acid Mixtures Using a Single-Wafer Wet Processor von Sih, Vincent, Lauerhaas, Jeffrey M., Reimer, Berthold, Ratkovich, Anthony S., Butterbaugh, Jeffery W.

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Advanced Cryogenic Aerosol Cleaning: Small Particle Removal and Damage-Free Performance von Printz, Wallace P., Rotondaro, Antonio L.P., Butterbaugh, Jeffery W., Rathman, Christina Ann, Thomes, Gregory P., Schwab, Brent D., Lauerhaas, Jeffrey M., Becker, David Scott, Mbanaso, Chimaobi, Bassett, Derek W.

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Reversible luminescence quenching of porous silicon by solvents von Lauerhaas, Jeffrey M, Credo, Grace M, Heinrich, Julie L, Sailor, Michael J

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Single Wafer Selective Silicon Nitride Removal with Phosphoric Acid and Steam von Butterbaugh, Jeffery W., Yu, Wesley, Ratkovich, Anthony, Yang, N.H., Kahaian, Don, Chien, C.C., Lin, J.F., Guo, Ted, Lin, Euing, Lauerhaas, Jeffrey M., Wu, J.Y.

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Novel Wet Etching of Silicon Nitride in a Single Wafer Spin Processor von Lauerhaas, Jeffrey M., Chen, C.C., Huang, Stanley, Ratkovich, Anthony, Yu, Bill, Jang, S.M., Yeh, Matt, Yang, David, Butterbaugh, Jeffery W.

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Electrochemiluminescence from porous silicon in formic acid liquid-junction cells von Green, Will H., Lee, Eric J., Lauerhaas, Jeffrey M., Bitner, Theodore W., Sailor, Michael J.

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Megasonic, Non-Contact Cleaning Followed by 'Rotagoni' Drying of CMP Wafers von Lauerhaas, Jeffrey M., Kenis, Karine, Fyen, Wim, Heyns, Marc, Mertens, Paul W., Nicolosi, Tom

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Yield Improvement Using Cryogenic Aerosol for BEOL Defect Removal von Lauerhaas, Jeff, Kok, Yav San, Hamzah, Ameer, Tan, Ling Tze

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Reversible luminescence quenching of porous Si by solvents von LAUERHAAS, J. M, CREDO, G. M, HEINRICH, J. L, SAILOR, M. J

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Preparation, Characterization, and Damage-Free Processing of Advanced Multiple-Gate FETs von Lauerhaas, Jeffrey M., Lee, Hu Cheng, Cleavelin, Rinn, Xiong, Wei Ze, Sherman, Kara, Mochizuki, Koki, Schruefer, Klaus, Schulz, Thomas, Clappin, Brian

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Light Emission from Porous Silicon: Polymer and Solution Contacts von Lauerhaas, Jeffrey M.

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Process for removing carbon material from substrates von LAUERHAAS JEFFREY M

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PROCESS FOR REMOVING CARBON MATERIAL FROM SUBSTRATES von LAUERHAAS, JEFFREY, M

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PROCESS FOR REMOVING CARBON MATERIAL FROM SUBSTRATES von LAUERHAAS JEFFREY M

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Process comprising water vapor for haze elimination and residue removal von KAHAIAN DON, LAUERHAAS JEFFREY M

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A Theoretical and Experimental Study of Damage-Free BEOL Cleaning with Megasonic Agitation von Lauerhaas, Jeffrey M., Bran, Mario, Fraser, Brian, Brause, Eric, Wu, Yi, Nicolosi, Tom

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System and method for monitoring treatment of microelectronic substrates with fluid sprays such as cryogenic fluid sprays von Schwab, Brent D, Thomes, Gregory P, Mbanaso, Chimaobi W, Lauerhaas, Jeffrey M, Rolf, Kevin

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PROCESS COMPRISING WATER VAPOR FOR HAZE ELIMINATION AND RESIDUE REMOVAL von KAHAIAN DON, LAUERHAAS JEFFREY M

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PROCESS COMPRISING WATER VAPOR FOR HAZE ELIMINATION AND RESIDUE REMOVAL von KAHAIAN, DON, LAUERHAAS, JEFFREY, M

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