Roll-to-roll manufacturing of electronics on flexible substrates using self-aligned imprint lithography (SAIL) von Kim, Han-Jun, Almanza-Workman, Marcia, Garcia, Bob, Kwon, Ohseung, Jeffrey, Frank, Braymen, Steve, Hauschildt, Jason, Junge, Kelly, Larson, Don, Stieler, Dan, Chaiken, Alison, Cobene, Bob, Elder, Richard, Jackson, Warren, Jam, Mehrban, Jeans, Albert, Luo, Hao, Mei, Ping, Perlov, Craig, Taussig, Carl

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77.3: Invited Paper: Roll-to-Roll Manufacturing of Backplanes for Paper-Like Displays von Taussig, Carl, Cobene, Robert, Elder, Richard, Jackson, Warren, Jam, Mehrban, Jeans, Albert, Luo, Hao, Maltabes, John, Mei, Ping, Smith, Mark, Perlov, Craig, Zhao, Lihua, Almanza-Workman, Marcia, Garcia, Robert, Kim, Hanjun, Kwon, Ohseung, Jeffrey, Frank

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Defect analysis of roll-to-roll SAIL manufactured flexible display backplanes von Taussig, C., Elder, R. E., Jackson, W. B., Jeans, A., Jam, M., Holland, E., Hao Luo, Maltabes, J., Perlov, C., Trovinger, S., Almanza-Workman, M., Garcia, R. A., HanJun Kim, Ohseung Kwon, Jeffrey, F.

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23.4: Invited Paper: Active-Matrix Backplanes Produced by Roll-to-Roll Self-Aligned Imprint Lithography (SAIL) von Jackson, Warren B., Almanza-Workman, Marcia, Chaiken, Alison, Garcia, Robert A., Jeans, Albert, Kwon, Ohseung, Luo, Hao, Mei, Ping, Perlov, Craig, Taussig, Carl, Braymen, Stephen, Jeffrey, Frank, Hauschildt, Jason

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Surface kinetics modeling of silicon and silicon oxide plasma etching. I. Effect of neutral and ion fluxes on etching yield of silicon oxide in fluorocarbon plasmas von Kwon, Ohseung, Sawin, Herbert H.

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Surface kinetics modeling of silicon and silicon oxide plasma etching. II. Plasma etching surface kinetics modeling using translating mixed-layer representation von Kwon, Ohseung, Sawin, Herbert H.

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Surface kinetics modeling of silicon and silicon oxide plasma etching.I. Effect of neutral and ion fluxes on etching yield of silicon oxidein fluorocarbon plasmas von Kwon, Ohseung, Sawin, Herbert H.

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Surface kinetics modeling of silicon and silicon oxide plasma etching.II. Plasma etching surface kinetics modeling using translating mixed-layer representation von Kwon, Ohseung, Sawin, Herbert H.

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Angular dependence of silicon oxide etching yieldin fluorocarbon chemistries von Kwon, Ohseung, Jin, Weidong, Sawin, Herbert H.

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Surface kinetics modeling of silicon and silicon oxide plasma etching. III. Modeling of silicon oxide etching in fluorocarbon chemistry using translating mixed-layer representation von Kwon, Ohseung, Bai, Bo, Sawin, Herbert H.

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Surface kinetics modeling of silicon and silicon oxide plasma etching.III. Modeling of silicon oxide etching in fluorocarbon chemistry using translating mixed-layer representation von Kwon, Ohseung, Bai, Bo, Sawin, Herbert H.

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Metastability in multicomponent oxide transistors von Jackson, Warren B., Hoffman, Randy, Yeh, Bao, Emery, Tim, Koch, Tim, McConica, C., Kwon, Ohseung

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Postsilicon Oxide Etch Cleaning Process Using Integrated Ashing and an HF Vapor Process von Kwon, Ohseung, Sawin, Herbert H.

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WIRE-ASSEMBLY APPARATUS FOR INVASIVE BIOSENSORS von Wang, Xianyan, Stowe, Timothy, KWON, Ohseung

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Wire-assembly apparatus for invasive biosensors von Kwon, Ohseung, Wang, Xianyan, Stowe, Timothy

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Angular dependence of silicon oxide etching yield in fluorocarbon chemistries von Kwon, Ohseung, Jin, Weidong, Sawin, Herbert H.

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A GaAs Power MESFET Operating at 3.3V Drain Voltage for Digital Hand‐Held Phone von Lee, Jong‐Lam, Kim, Haecheon, Mun, Jae Kyung, Kwon, Ohseung, Lee, Jae Jin, Hwang, In Duk, Park, Hyung‐Moo

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A comparison of processes and challenges between organic, a-Si:H, and oxide TFTs for active matrix backplanes on plastic von de la Fuente Vornbrock, A., Almanza-Workman, M., Dickin, F., Elder, R. E., Garcia, R. A., Holland, E., Jackson, W., Jam, M., Jeans, A., Han-Jun Kim, Hao Luo, Ohseung Kwon, Maltabes, J., Ping Mei, Perlov, C., Rudin, J. C., Smith, M., Trovinger, S., Lihua Zhao, Taussig, C. P.

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Analysis of Anabolic Steroids Using GC/MS with Selected Ion Monitoring von Chung, BongChul, Choo, Hea-Young P., Kim, TaeWook, Eom, KheeDong, Kwon, OhSeung, Suh, Jawon, Yang, Jongsoon, Park, Jongsei

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WIRE-ASSEMBLY APPARATUS FOR INVASIVE BIOSENSORS von Kwon, Ohseung, Wang, Xianyan, Stowe, Timothy

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