Treffer 1 - 5 von 5 für Suche 'Kwon, Hyeokkyu', Suchdauer: 0,36s Treffer weiter einschränken
  1. 1
    고밀도 C 4 F 8 플라즈마에서 증착된 불화탄소막의 광학적 및 전기적 특성

    고밀도 C 4 F 8 플라즈마에서 증착된 불화탄소막의 광학적 및 전기적 특성 von 권혁규, Hyeokkyu Kwon, 유상현, Sanghyun You, 김준현, Jun-hyun Kim, 김창구, Chang-koo Kim


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  2. 2
    Comparison of deep silicon etching using SF6/C4F8 and SF6/C4F6 plasmas in the Bosch process

    Comparison of deep silicon etching using SF6/C4F8 and SF6/C4F6 plasmas in the Bosch process von Rhee, Hyongmoo, Kwon, Hyeokkyu, Kim, Chang-Koo, Kim, HyunJung, Yoo, Jaisuk, Kim, Yil Wook


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  3. 3
    Electroless Deposition of CoWP Capping Layers Using Alkali-Metal-Free Chemicals

    Electroless Deposition of CoWP Capping Layers Using Alkali-Metal-Free Chemicals von Lee, Hae-Min, Kwon, Hyeokkyu, Dulal, S. M. Shahinoor I., Kim, Chang-Koo


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  4. 4
    Control of the Electrical and Optical Properties of Plasma Polymerized Fluorocarbon Films

    Control of the Electrical and Optical Properties of Plasma Polymerized Fluorocarbon Films von Kwon, Hyeokkyu, Mahapatra, Santosh, Park, Byunghoon, Woo, Sang Ho, Kim, Chang-Koo


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  5. 5
    Comparison of deep silicon etching using SF 6 / C 4 F 8 and SF 6 / C 4 F 6 plasmas in the Bosch process

    Comparison of deep silicon etching using SF 6 / C 4 F 8 and SF 6 / C 4 F 6 plasmas in the Bosch process von Rhee, Hyongmoo, Kwon, Hyeokkyu, Kim, Chang-Koo, Kim, HyunJung, Yoo, Jaisuk, Kim, Yil Wook


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