Dedicated process architecture and the characteristics of 1.4 μm pixel CMOS image sensor with 8M density von Chang-Rok Moon, Jong-Cheol Shin, Jinho Kim, Yun Ki Lee, Young-Joon Cho, Yu-Yeon Yu, Seong-Ho Hwang, Byung Jun Park, Hwang-Yoon Kim, Seok-Ha Lee, Jongwan Jung, Seong-Ho Cho, Kangbok Lee, Kwangok Koh, Duckhyung Lee, Kinam Kim

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1/2.5" 8 mega-pixel CMOS Image Sensor with enhanced image quality for DSC application von Jinho Kim, Jongchol Shin, Chang-Rok Moon, Seok-Ha Lee, Doo-Cheol Park, Heegeun Jeong, Doowon Kwon, Jongwan Jung, Hyunpil Noh, Kangbok Lee, Kwangok Koh, Duckhyung Lee, Kinam Kim

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Controlled Nitrogen Incorporation at Si–SiO 2 Interfaces by Remote Plasma-Assisted Processing von Koh, Kwangok, Niimi, Hiro, Lucovsky, Gerald, Green, Martin. L.

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University and small firm collaboration for process development of advanced gate dielectrics von Young, C., Barnes, B., Castro, S., Condon, E., Kwangok Koh, Schrader, M., Shah, S., Williamson, K., Meimei Xu, Kuehn, R., Maher, D., Venables, D., Oberhofer, A., Gong Wang, Chen, J.

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A novel 0.79μm2 SRAM cell by KrF lithography and high performance 90nm CMOS technology for ultra high speed SRAM von JUNG, Soon-Moon, KWON, Hyungshin, LYU, Gyuho, PARK, Joonbum, CHANG, Chulsoon, JANG, Youngchul, PARK, Donggun, KIM, Kinam, MOON YONG LEE, JEONG, Jaehun, CHO, Wonseok, KIM, Sungbong, LIM, Hoon, KOH, Kwangok, RAH, Youngseop, PARK, Jaekyun, KANG, Heesoo

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