Estimation of ion incident angle from Si etching profiles von GOTOH, Y, KURE, T, TACHI, S

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Analysis of Polymer Formation during SiO 2 Microwave Plasma Etching von Gotoh, Yasushi, Tokuo Kure, Tokuo Kure

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Single-electron memory for giga-to-tera bit storage von Yano, K., Ishii, T., Sano, T., Mine, T., Murai, F., Hashimoto, T., Kobayashi, T., Kure, T., Seki, K.

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Picosecond time-resolved spectroscopy of the photoluminescence intensity and its dynamical linear polarization of porous Si by 2.86 eV pulse excitation von AKIYAMA, N, ISHII, K, OHKURA, M, KURE, T, OHKURA, H

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Highly Selective Etching of Poly-Si by Time Modulation Bias von Ono, Tetsuo, Miyazaki, Hiroshi, Mizutani, Tatsumi, Goto, Yasushi, Kure, Tokuo

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Highly Anisotropic Etching of Polysilicon by Time-Modulation Bias von Ono, Tetsuo, Mizutani, Tatsumi, Goto, Yasushi, Kure, Tokuo

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Analysis of polymer formation during SiO2 microwave plasma etching von GOTOH, Y, KURE, T

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Tungsten gate technology for quarter-micron application von NODA, H, SAKIYAMA, H, GOTO, Y, KURE, T, KIMURA, S

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Nucleation and crystallization characteristics of phosphorus-doped amorphous silicon slit nano wire von WADA, Y, KOBAYASHI, T, KURE, T, YOSHIMURA, T, SUDOU, Y, GOTOU, Y, KONDO, S

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Low-temperature etching for deep-submicron trilayer resist von KURE, T, KAWAKAMI, H, TACHI, S, ENAMI, H

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Subthreshold current reduction for decoded-driver by self-reverse biasing (DRAMs) von Kawahara, T., Horiguchi, M., Kawajiri, Y., Kitsukawa, G., Kure, T., Aoki, M.

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Method for cleaning piping and cleaning system for piping von Suematsu Takaaki, Kure Tokuo, Araki Tomoyuki, Saito Kenji, Higashi Eiji

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U-Groove Isolation Technology for High Density Bipolar LSI's von Tamaki, Yoichi, Kure, Tokuo, Shiba, Takeo, Higuchi, Hisayuki

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A 1-V, 100-MHz, 10-mW cache using a separated bit-line memory hierarchy architecture and domino tag comparators von Mizuno, H., Matsuzaki, N., Osada, K., Shinbo, T., Ohki, N., Ishida, H., Ishibashi, K., Kure, T.

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METHOD FOR CLEANING PIPING AND CLEANING SYSTEM FOR PIPING von ARAKI TOMOYUKI, KURE TOKUO, SUEMATSU TAKAAKI, HIGASHI EIJI, SAITO KENJI

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Carrier reflection at the superconductor-semiconductor boundary observed using a coplanar-point-contact injector von NISHINO, T, HATANO, M, HASEGAWA, H, KURE, T, MURAI, F

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CLEANING METHOD FOR PIPING AND CLEANING SYSTEM FOR PIPING von AZUMA EIJI, ARAKI TOMOYUKI, KURE TOKUO, SUEMATSU TAKAAKI, SAITO KENJI

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METHOD FOR CLEANING PIPING AND CLEANING SYSTEM FOR PIPING von KURE, TOKUO, SAITO, KENJI, SUEMATSU, TAKAAKI, ARAKI, TOMOYUKI, HIGASHI, EIJI

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A nondestructive analysis technique for residual thin films in deep-submicron contact holes von Ninomiya, Ken, Kure, Tokuo, Sudo, Yoshimi, Kuroda, Katsuhiro, Todokoro, Hideo

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Cleaning system for piping von KURE, TOKUO, SAITO, KENJI, SUEMATSU, TAKAAKI, ARAKI, TOMOYUKI, HIGASHI, EIJI

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