Low-k protection from F radicals and VUV photons using a multilayer pore grafting approach von Zotovich, A, Rezvanov, A, Chanson, R, Zhang, L, Hacker, N, Kurchikov, K, Klimin, S, Zyryanov, S M, Lopaev, D, Gornev, E, Clemente, I, Miakonkikh, A, Maslakov, K

Volltext

Determination of the excited argon states densities in high-frequency capacitive discharge von Kovalev, A. S., Kurchikov, K. A., Proshina, O. V., Rakhimova, T. V., Vasilieva, A. N., Voloshin, D. G.

Volltext

Interaction of F atoms with SiOCH ultra-low-k films: I. Fluorination and damage von Rakhimova, T V, Lopaev, D V, Mankelevich, Yu A, Rakhimov, A T, Zyryanov, S M, Kurchikov, K A, Novikova, N N, Baklanov, M R

Volltext

Low-k films modification under EUV and VUV radiation von Rakhimova, T V, Rakhimov, A T, Mankelevich, Yu A, Lopaev, D V, Kovalev, A S, Vasil'eva, A N, Zyryanov, S M, Kurchikov, K, Proshina, O V, Voloshin, D G, Novikova, N N, Krishtab, M B, Baklanov, M R

Volltext

Interaction of F atoms with SiOCH ultra low-k films. Part II: etching von Rakhimova, T V, Lopaev, D V, Mankelevich, Yu A, Kurchikov, K A, Zyryanov, S M, Palov, A P, Proshina, O V, Maslakov, K I, Baklanov, M R

Volltext

Modification of organosilicate glasses low-k films under extreme and vacuum ultraviolet radiation von Rakhimova, T. V., Rakhimov, A. T., Mankelevich, Yu. A., Lopaev, D. V., Kovalev, A. S., Vasil'eva, A. N., Proshina, O. V., Braginsky, O. V., Zyryanov, S. M., Kurchikov, K., Novikova, N. N., Baklanov, M. R.

Volltext

Measurements of the populations of metastable and resonance levels in the plasma of an RF capacitive discharge in argon von Vasilieva, A. N., Voloshin, D. G., Kovalev, A. S., Kurchikov, K. A.

Volltext

Inhibition of acetylcholine responses by intracellular calcium in Lymnaea stagnalis neurones von Chemeris, N K, Kazachenko, V N, Kislov, A N, Kurchikov, A L

Volltext