Spontaneous oxide reduction in metal stacks von Qin, Wentao, Volinsky, Alex A., Werho, Dennis, Theodore, N. David, Kottke, Mike, Ramiah, Chandra

Volltext

Root-Cause Analysis and Statistical Process Control of Epilayers for SiGe:C Hetero-Structure Bipolar Transistors von Xie, Qianghua, Duda, Erika, Kottke, Mike, Qin, Wentao, Wang, Xiangdong, Lu, Shifeng, Erickson, Martha, Kretzschmar, Heather, Cross, Linda, Murphy, Sharon

Volltext

Solderability degradation models for fusible tin alloy coatings on copper substrates von Geist, H., Kottke, M.

Volltext

Identification of the Product of Photoswitching of an Oxazine Fluorophore Using Fourier Transform Infrared Difference Spectroscopy von Kottke, Tilman, van de Linde, Sebastian, Sauer, Markus, Kakorin, Sergej, Heilemann, Mike

Volltext

New Materials, Processes and Device Structures for 65nm CMOS Technology Node and Beyond von Nguyen, Bich-Yen, Thean, Aaron, Zhang, Da, White, Ted, Sadaka, Mariam, Triyoso, Dina, Schaeffer, Jamie, Goolsby, Brian, Nguyen, Thien, Dhandapani, Veer, Vartanian, Victor, McCormick, Linda, Theodore, David, Zollner, Stefan, Xie, Qianghau, Wang, Xiang-Dong, Shi, Zhanghai, Mathew, Leo, Zavala, Melissa, Parker, Colita, Collard, Heather, Hildreth, Jill, Prabhu, Lata, Rai, Raghaw, Murphy, Sharon, Montgomery, Patrick, Kalpat, Sriram, Ramon, Michael, Gilmer, David, Taylor, Bill, Demkov, Alex, Adams, Vance, Jiang, Jack, Chen, Jian, Chang, Cheng-Hung, Kaushik, Vidya, Chandna, Luna, Sadd, Mike, Barr, Alex, Vandooren, Anne, Pham, Daniel, Mendicino, Mike, Cheek, Jon, Tseng, Hsing, White, Bruce, Tobin, Phil, Orlowski, Marius, Venkatesan, Suresh, Kolagunta, Venkat, Mogab, Joe, Canonico, M., Kottke, M.

Volltext