Line-profile and critical-dimension monitoring using a normal incidence optical CD metrology von Weidong Yang, Jiangtao Hu, Lowe-Webb, R., Korlahalli, R., Shivaprasad, D., Sasano, H., Wei Liu, Mui, D.S.L.

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Measurements of shallow trench isolation by normal incidence optical critical dimension technique von Hu, Jiangtao, Korlahalli, Rahul, Shivaprasad, Deepak, Yang, Feng, Zhang, Xiaodong

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Line-profile and critical-dimension monitoring using a normal incidence optical CD metrology von Yang, Weidong, Hu, Jiangtao, Lowe-Webb, R, Korlahalli, R, Shivaprasad, D, Sasano, H, Liu, Wei, Mui, D S L

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Line-profile and critical dimension measurements using a normal incidence optical metrology system von Weidong Yang, Lowe-Webb, R., Korlahalli, R., Zhuang, V., Sasano, H., Wei Liu, Mui, D.

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