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  1. 1
    Process and chamber health monitoring of plasma enhanced ti deposition process through high performance VI-probe

    Process and chamber health monitoring of plasma enhanced ti deposition process through high performance VI-probe von Kye Hyun Baek, Coonan, B., Carbery, M., Jinkyung Joo, Hyunsoo Woo, Tae Soon Lee, Hyeon Soo An, Yoonbon Koo, Cheonsu Han, Sungho Han, Yongjin Kim, Seong Woon Choi, Woosung Han


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  2. 2
    SEMICONDUCTOR MANUFACTURING APPARATUS, GAS SUPPLYING METHOD USING THE SAME, AND SEMICONDUCTOR MANUFACTURING METHOD USING THE SAME

    SEMICONDUCTOR MANUFACTURING APPARATUS, GAS SUPPLYING METHOD USING THE SAME, AND SEMICONDUCTOR MANUFACTURING METHOD USING THE SAME von LIM, Chan Kyu, Gim, Suji, Kang, Hanhim, Lim, Jongkoo, Koo, Yoonbon

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  3. 3
    Study on Interface Engineering of TiN/SiO2 Layers to Reduce the Parasitic Capacitance in CMOS Circuits

    Study on Interface Engineering of TiN/SiO2 Layers to Reduce the Parasitic Capacitance in CMOS Circuits von Kim, Suncheul, Bae, Jong-yong, Park, Miseok, Kwon, Yong Il, Han, Dong-Hoon, Lee, Ui-Hyoung, Koo, Yoonbon


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