Control of Bubble Defects in UV Nanoimprint von Hiroshima, Hiroshi, Komuro, Masanori

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Imprint Characteristics by Photo-Induced Solidification of Liquid Polymer von Komuro, Masanori, Taniguchi, Jun, Inoue, Seiji, Kimura, Naoya, Tokano, Yuji, Hiroshima, Hiroshi, Matsui, Shinji

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Elimination of Pattern Defects of Nanoimprint under Atmospheric Conditions von Hiroshima, Hiroshi, Komuro, Masanori, Kasahara, Nobuyuki, Kurashima, Yuichi, Taniguchi, Jun

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Evaluation of Line Edge Roughness in Nanoimprint Lithography Using Photocurable Polymer von Kurashima, Yuichi, Komuro, Masanori, Hiroshima, Hiroshi, Taniguchi, Jun, Miyamoto, Iwao

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Line Width Reproducibility of Photo-Nanoimprints von Hiroshima, Hiroshi, Kurashima, Yuichi, Komuro, Masanori

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Measurement of Adhesive Force Between Mold and Photocurable Resin in Imprint Technology von Taniguchi, Jun, Kawasaki, Takeshi, Tokano, Yuji, Kogo, Yasuo, Miyamoto, Iwao, Komuro, Masanori, Hiroshima, Hiroshi, Sakai, Nobuji, Tada, Kentaro

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Step-and-Repeat Photo-Nanoimprint System Using Active Orientation Head von Hiroshima, Hiroshi, Komuro, Masanori, Kurashima, Yuichi, Kim, Sang Hoon, Muneishi, Takeshi

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High growth rate for slow scanning in electron-beam-induced deposition von HIROSHIMA, H, KOMURO, M

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Fabrication of Low Line Edge Roughness Mold by Spin On Glass (SOG) Replica Method von Kurashima, Yuichi, Hiroshima, Hiroshi, Komuro, Masanori, Yamazaki, Naoto, Taniguchi, Jun, Miyamoto, Iwao

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Preparation of Diamond Mold Using Electron Beam Lithography for Application to Nanoimprint Lithography von Jun Taniguchi, Jun Taniguchi, Yuji Tokano, Yuji Tokano, Iwao Miyamoto, Iwao Miyamoto, Masanori Komuro, Masanori Komuro, Hiroshi Hiroshima, Hiroshi Hiroshima, Kazuhiko Kobayashi, Kazuhiko Kobayashi, Takeshi Miyazaki, Takeshi Miyazaki, Hideyuki Ohyi, Hideyuki Ohyi

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Bilayer Resist Method for Room-Temperature Nanoimprint Lithography von Nakamatsu, Ken-ichiro, Watanabe, Keiichiro, Tone, Katsuhiko, Katase, Tetsuya, Hattori, Wataru, Ochiai, Yukinori, Matsuo, Takahiro, Sasago, Masaru, Namatsu, Hideo, Komuro, Masanori, Matsui, Shinji

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Uniformity in Patterns Imprinted Using Photo-Curable Liquid Polymer von Hiroshima, Hiroshi, Inoue, Seiji, Kasahara, Nobuyuki, Taniguchi, Jun, Miyamoto, Iwao, Komuro, Masanori

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Fabrication of Low Line Edge Roughness Mold for Photo-Nanoimprint von Kurashima, Yuichi, Hiroshima, Hiroshi, Komuro, Masanori, Kim, Sang Hoon, Yamazaki, Naoto, Taniguchi, Jun, Miyamoto, Iwao, Namatsu, Hideo, Matsui, Shinji

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Fabrication of conductive wires by electron-beam-induced deposition von Hiroshima, Hiroshi, Komuro, Masanori

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Room Temperature Nanoimprint Technology Using Hydrogen Silsequioxane (HSQ) von Igaku, Yutaka, Matsui, Shinji, Ishigaki, Hiroyuki, Fujita, Jun-ichi, Ishida, Masahiko, Ochiai, Yukinori, Namatsu, Hideo, Komuro, Masanori, Hiroshima, Hiroshi

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Improvement of Imprinted Pattern Uniformity Using Sapphire Mold von Komuro, Masanori, Tokano, Yuji, Taniguchi, Jun, Kawasaki, Takeshi, Miyamoto, Iwao, Hiroshima, Hiroshi

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Reducing Photocurable Polymer Pattern Shrinkage and Roughness during Dry Etching in Photo-Nanoimprint Lithography von Kim, Sang Hoon, Hiroshima, Hiroshi, Inoue, Seiji, Kurashima, Yuichi, Komuro, Masanori

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Conditions for Fabrication of Highly Conductive Wires by Electron-Beam-Induced Deposition von Hiroshima, Hiroshi, Suzuki, Norihito, Ogawa, Naomi, Komuro, Masanori

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Electron beam assisted chemical etching of single-crystal diamond substrates with hydrogen gas von TANIGUCHI, J, MIYAMOTO, I, OHNO, N, KANTANI, K, KOMURO, M, HIROSHIMA, H

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Characteristics of SiO2 as a high-resolution electron beam resist von HIROSHIMA, H, KOMURO, M

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