Design, synthesis, characterization, and use of all-organic, nonionic photogenerators of acid von Houlihan, F. M, Neenan, T. X, Reichmanis, E, Kometani, J. M, Chin, T

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The role of molecular defects on the structure and phase transitions of poly(vinylidene fluoride) von Lovinger, Andrew J., Davis, D.D., Cais, R.E., Kometani, J.M.

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Novel Photoresists Incorporating [(Trimethylsilyl)oxy]styrene von Uhrich, K. E, Reichmanis, E, Heffner, S. A, Kometani, J. M, Nalamasu, O

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On the Curie temperature of poly(vinylidene fluoride) von Lovinger, Andrew J, Davis, D. D, Cais, R. E, Kometani, J. M

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Photo- and thermochemistry of select 2,6-dinitrobenzyl esters in polymer matrices: studies pertaining to chemical amplification and imaging von NEENAN, T. X, HOULIHAN, F. M, REICHMANIS, E, KOMETANI, J. M, BACHMAN, B. J, THOMPSON, L. F

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Radiation-induced chemistry of poly(4-[(tert-butoxycarbonyl)oxy]styrene-co-sulfur dioxide) von Novembre, A. E, Tai, W. W, Kometani, J. M, Hanson, J. E, Nalamasu, O, Taylor, G. N, Reichmanis, E, Thompson, L. F

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Photogenerators of Sulfamic Acids; Use in Chemically Amplified Single Layer Resists von Houlihan, F. M., Kometani, J. M., Timko, A. G., Hutton, R. S., Gabor, A. H., Medina, A. N., Biafore, J. J., Slater, S. G.

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A Commercially Viable 193 nm Single Layer Resist Platform von Houlihan, F.M., Wallow, T., Timko, A., Neria, E., Hutton, R., Cirelli, R., Kometani, J. M., Nalamasu, O., Reichmanis, E.

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Formation of Polymers Containing 4-Hydroxystyrene via Hydrolysis of 4-((Trimethylsilyl)oxy)styrene von Uhrich, K. E, Reichmanis, E, Heffner, S. A, Kometani, J. M

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A novel approach to inducing aqueous base solubility in substituted styrene-sulfone polymers von Kometani, J. M, Galvin, M. E, Heffner, S. A, Houlihan, F. M, Nalamasu, O, Chin, E, Reichmanis, E

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Synthesis and characterization of poly[4-((tert-butoxycarbonyl)oxy)styrene-sulfone] von Kanga, R. S, Kometani, J. M, Reichmanis, Elsa, Hanson, J. E, Nalamasu, O, Thompson, L. F, Heffner, S. A, Tai, W. W, Trevor, P

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Photogenerated Acid-Catalyzed Formation of Phosphonic/Phosphoric Acids by Deprotection of Esters in Polymer Films von Schilling, Marcia L, Katz, Howard E, Houlihan, Francis M, Kometani, Janet M, Stein, Susan M, Nalamasu, Omkaram

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Identification of sensitive positive and negative working resist materials for proximity X-ray lithography von Novembre, A.E., Kometani, J.M., Knurek, C.S., Kumar, U., Neenan, T.X., Mixon, D.A., Nalamasu, O., Mu¨nzel, N.

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Compositional variation of the structure and solid-state transformations of vinylidene fluoride/tetrafluoroethylene copolymers von Lovinger, Andrew J, Davis, Don D, Cais, Rudolf E, Kometani, Janet M

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New isomers of poly(vinyl fluoride) with controlled regiosequence microstructure von Cais, Rudolf E., Kometani, Janet M.

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Arylmethyl sulfones: A new class of photoacid generators von Novembre, A. E., Hanson, J. E., Kometani, J. M., Tai, W. W., Reichmanis, E., Thompson, L. F., West, R. J.

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The synthesis and characterization of novel 2-nitrobenzyl sulfonate photo-generators of acid von Houlihan, F. M., Neenan, T. X., Chin, E., Reichmanis, E., Kometani, J. M.

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Ferroelectric properties of form I perdeuteriated poly(vinylidene fluoride) von Takase, Y, Tanaka, Hajime, Wang, T. T, Cais, R. E, Kometani, J. M

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Photo- and thermochemistry of select 2,6-dinitrobenzyl esters in polymer matrixes: studies pertaining to chemical amplification and imaging von Neenan, T. X, Houlihan, F. M, Reichmanis, E, Kometani, J. M, Bachman, B. J, Thompson, L. F

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Lithographic performance of 193 nm single and bi-layer materials von Goethals, A.M., Pollers, I., Roey, F. van, Sugihara, T., Ronse, K., Driessche, V. van, Tzviatkov, P., Medina, A., Gabor, A., Blakeney, A., Steinhausler, T., Biafore, J., Slater, S., Nalamasu, O., Houlihan, F., Kometani, J., Timko, A., Cirelli, R.

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