Nitridation of niobium oxide films by rapid thermal processing von Matylitskaya, V. A., Bock, W., Kolbesen, B. O.

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Formation of tantalum nitride films by rapid thermal processing von Angelkort, C, Berendes, A, Lewalter, H, Bock, W, Kolbesen, B.O

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A combined SNMS and EFTEM/EELS study on focused ion beam prepared vanadium nitride thin films von Kothleitner, Gerald, Rogers, M., Berendes, A., Bock, W., Kolbesen, B.O.

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Formation of niobium oxynitrides by rapid thermal processing (RTP) von Matylitskaya, V.A., Bock, W., Thoma, K., Kolbesen, B.O.

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Annealing of thin B/Nb₂N bilayers, B/Nb bilayers and Nb/B/Nb trilayers via rapid thermal processing (RTP) von Mertens, R, Bock, W, Lommel, B, Kolbesen, B. O

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Niobium nitride films formed by rapid thermal processing (RTP): a study of depth profiles and interface reactions by complementary analytical techniques von Berendes, A, Brunkahl, O, Angelkort, C, Bock, W, Hofer, F, Warbichler, P, Kolbesen, B. O

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Formation of vanadium nitride by rapid thermal processing von GALESIC, I, KOLBESEN, B. O

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Comparing the chemical properties of evaporated and sputtered niobium films on oxidized Si(1 0 0) wafers – preparation of oxynitride films von Brunkahl, O., Bock, W., Thoma, K., Kolbesen, B.O.

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Formation of niobium nitride by rapid thermal processing von Angelkort, C, Lewalter, H, Warbichler, P, Hofer, F, Bock, W, Kolbesen, B.O

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Analysis of time-dependent haze on silicon surfaces von MÜNTER, N, KOLBESEN, B. O, STORM, W, MÜLLER, T

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Formation and nitridation of vanadium-aluminum intermetallic compounds von Lewalter, H, Bock, W, Kolbesen, B O

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Decoration and preferential etching of crystal defects in silicon materials: influence of metal decoration on the defect etching process von Idrisi, H., Sinke, T., Gerhardt, V., Ceglarek, D., Kolbesen, B. O.

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Scanning probe microscopy — a tool for the investigation of high- k materials von Landau, S.A, Junghans, N, Weiß, P.-A, Kolbesen, B.O, Olbrich, A, Schindler, G, Hartner, W, Hintermaier, F, Dehm, C, Mazuré, C

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Nitridation of vanadium in molecular nitrogen: a comparison of rapid thermal processing (RTP) and conventional furnace annealing von Galesic, I, Reusch, U, Angelkort, C, Lewalter, H, Berendes, A, Schweda, E, Kolbesen, B.O

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Influence of silicon crystal defects and contamination on the electrical behavior of power devices von Schulze, H.-J, Kolbesen, B.O

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Total-reflection X-ray fluorescence study of electrochemical deposition of metals on a glass-ceramic carbon electrode surface von Alov, N.V, Oskolok, K.V, Wittershagen, A, Mertens, M, Rittmeyer, C, Rostam-Khani, P, Kolbesen, B.O

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Trace element determination in drugs by total-reflection X-ray fluorescence spectrometry von Wagner, M., Rostam-Khani, P., Wittershagen, A., Rittmeyer, Claudia, Kolbesen, B.O., Hoffmann, H.

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Alkaline cleaning of silicon wafers: additives for the prevention of metal contamination von Martin, A.R., Baeyens, M., Hub, W., Mertens, P.W., Kolbesen, B.O.

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Depth distribution of zinc adsorbed on silicon surfaces out of alkaline aqueous solutions von Ochs, H, Bublak, D, Wild, U, Muhler, M, Kolbesen, B.O

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Determination of metal-cofactors in enzyme complexes by total-reflection X-ray fluorescence spectrometry von Wittershagen, A., Rostam-Khani, P., Klimmek, O., Groß, R., Zickermann, V., Zickermann, I., Gemeinhardt, S., Kröger, A., Ludwig, B., Kolbesen, B.O.

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