Treffer 1 - 20 von 20 für Suche 'Kluth, G. Jonathan', Suchdauer: 0,96s Treffer weiter einschränken
  1. 1
    Direct observation of sulfur dimers in alkanethiol self-assembled monolayers on Au(111)

    Direct observation of sulfur dimers in alkanethiol self-assembled monolayers on Au(111) von Kluth, G. Jonathan, Carraro, Carlo, Maboudian, Roya


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  2. 2
    Thermal Behavior of Alkyl Monolayers on Silicon Surfaces

    Thermal Behavior of Alkyl Monolayers on Silicon Surfaces von Sung, Myung M, Kluth, G. Jonathan, Yauw, Oranna W, Maboudian, Roya

    Veröffentlicht in Langmuir

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  3. 3
    Oxidation mechanism of the ammonium-fluoride-treated Si(100) surface

    Oxidation mechanism of the ammonium-fluoride-treated Si(100) surface von Kluth, G. Jonathan, Maboudian, Roya

    Veröffentlicht in Journal of applied physics

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  4. 4
    Thermal Behavior of Alkylsiloxane Self-Assembled Monolayers on the Oxidized Si(100) Surface

    Thermal Behavior of Alkylsiloxane Self-Assembled Monolayers on the Oxidized Si(100) Surface von Kluth, G. Jonathan, Sung, Myung M, Maboudian, Roya

    Veröffentlicht in Langmuir

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  5. 5
    Alkene based monolayer films as anti-stiction coatings for polysilicon MEMS

    Alkene based monolayer films as anti-stiction coatings for polysilicon MEMS von Ashurst, W.Robert, Yau, Christina, Carraro, Carlo, Lee, Christina, Kluth, G.Jonathan, Howe, Roger T., Maboudian, Roya


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  6. 6
    Formation of alkylsiloxane self-assembled monolayers on Si3N4

    Formation of alkylsiloxane self-assembled monolayers on Si3N4 von Sung, Myung M., Kluth, G. Jonathan, Maboudian, Roya


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  7. 7
    Measurement of lateral diffusion of diffused layers

    Measurement of lateral diffusion of diffused layers von BORDEN PETER G.,KLUTH JONATHAN G.,PATON ERIC

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  8. 8
    Interaction of H(D) Atoms with Octadecylsiloxane Self-Assembled Monolayers on the Si(100) Surface

    Interaction of H(D) Atoms with Octadecylsiloxane Self-Assembled Monolayers on the Si(100) Surface von Kluth, G. Jonathan, Sung, Myung M, Maboudian, Roya

    Veröffentlicht in Langmuir

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  9. 9
    Formation of alkylsiloxane self-assembled monolayers on Si 3 N 4

    Formation of alkylsiloxane self-assembled monolayers on Si 3 N 4 von Sung, Myung M., Kluth, G. Jonathan, Maboudian, Roya


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  10. 10
    Method of forming a CMOS transistor having ultra shallow source and drain regions

    Method of forming a CMOS transistor having ultra shallow source and drain regions von Erhardt, Jeff, Yu, Bin, Kluth, G. Jonathan

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  11. 11
    Measurement of lateral diffusion of diffused layers

    Measurement of lateral diffusion of diffused layers von BORDEN PETER G, PATON ERIC, KLUTH G. JONATHAN

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  12. 12
    Measurement of lateral diffusion of diffused layers

    Measurement of lateral diffusion of diffused layers von Borden, Peter G, Kluth, G. Jonathan, Paton, Eric

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  13. 13
    Measurement of lateral diffusion of diffused layers

    Measurement of lateral diffusion of diffused layers von JONATHAN G. KLUTH, PETER G. BORDEN, ERIC PATON

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  14. 14
    MEASUREMENT OF LATERAL DIFFUSION OF DIFFUSED LAYERS

    MEASUREMENT OF LATERAL DIFFUSION OF DIFFUSED LAYERS von JONATHAN G. KLUTH, PETER G. BORDEN, ERIC PATON

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  15. 15
    MEASUREMENT OF LATERAL DIFFUSION OF DIFFUSED LAYERS

    MEASUREMENT OF LATERAL DIFFUSION OF DIFFUSED LAYERS von BORDEN PETER G, PATON ERIC, KLUTH G. JONATHAN

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  16. 16
    MEASUREMENT OF LATERAL DIFFUSION OF DIFFUSED LAYERS

    MEASUREMENT OF LATERAL DIFFUSION OF DIFFUSED LAYERS von BORDEN, PETER G, PATON, ERIC, KLUTH, JONATHAN G

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  17. 17
    Method of forming a CMOS transistor having ultra shallow source and drain regions

    Method of forming a CMOS transistor having ultra shallow source and drain regions von ERHARDT JEFF, YU BIN, KLUTH G. JONATHAN

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  18. 18
    Nondestructive, in-line characterization of device performance parameters of shallow junction processes

    Nondestructive, in-line characterization of device performance parameters of shallow junction processes von Kluth, G. Jonathan, En, William G., Borden, P., Bechtler, L., Nijmeijer, R.


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  19. 19
    Method for evaluating a semiconductor wafer and related apparatus

    Method for evaluating a semiconductor wafer and related apparatus von BORDEN, PETER G, PATON, ERIC, KLUTH, G. JONATHAN

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  20. 20
    Measurement of lateral diffusion of diffused layers

    Measurement of lateral diffusion of diffused layers von BORDEN, PETER G, PATON, ERIC, KLUTH, JONATHAN G

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