Nature of the filament formed in HfO2-based resistive random access memory von De Stefano, Francesca, Houssa, Michel, Afanas'ev, Valeri V., Kittl, Jorge A., Jurczak, Małgorzata, Stesmans, Andre

Volltext

Modeling Transient Negative Capacitance in Steep-Slope FeFETs von Obradovic, Borna, Rakshit, Titash, Hatcher, Ryan, Kittl, Jorge A., Rodder, Mark S.

Volltext

Balancing SET/RESET Pulse for > 1010 Endurance in HfO2/Hf 1T1R Bipolar RRAM von YANG YIN CHEN, GOVOREANU, Bogdan, ALTIMIME, Laith, GOUX, Ludovic, DEGRAEVE, Robin, FANTINI, Andrea, SANKAR KAR, Gouri, WOUTERS, Dirk J, GROESENEKEN, Guido, KITTL, Jorge A, JURCZAK, Malgorzata

Volltext

A Monte Carlo study of the low resistance state retention of HfOx based resistive switching memory von Yu, Shimeng, Yin Chen, Yang, Guan, Ximeng, Philip Wong, H.-S., Kittl, Jorge A.

Volltext

Seed Layer and Multistack Approaches to Reduce Leakage in SrTiO3-Based Metal--Insulator--Metal Capacitors Using TiN Bottom Electrode von Menou, Nicolas, Popovici, Mihaela, Opsomer, Karl, Kaczer, Ben, Pawlak, Malgorzata A, Adelmann, Christoph, Franquet, Alexis, Favia, Paola, Bender, Hugo, Detavernier, Christophe, Van Elshocht, Sven, Wouters, Dirk J, Biesemans, Serge, Kittl, Jorge A

Volltext

Improved EOT and leakage current for metal-insulator-metal capacitor stacks with rutile TiO2 von POPOVICI, Mihaela, KIM, Min-Soo, ALTIMIME, Laith, VAN ELSHOCHT, Sven, KITTL, Jorge A, TOMIDA, Kazuyuki, SWERTS, Johan, TIELENS, Hilde, MOUSSA, Alain, RICHARD, Olivier, BENDER, Hugo, FRANQUET, Alexis, CONARD, Thierry

Volltext

Manufacturable Processes for < 32-nm-node CMOS Enhancement by Synchronous Optimization of Strain-Engineered Channel and External Parasitic Resistances von NOORI, Atif M, BALSEANU, Mihaela, LAUWERS, Anne, LEE, Wen-Chin, JIANXIN LEI, MANDREKAR, Tushar, SCHREUTELKAMP, Robert, SHAH, Kavita, THOMPSON, Scott E, VERHEYEN, Peter, WANG, Ching-Ya, XIA, Li-Qun, BOELEN, Pieter, ARGHAVANI, Reza, COCKBUM, Andrew, DEMUYNCK, Steven, FELCH, Susan, GANDIKOTA, Srinivas, JERRY GELATOS, A, KHANDELWAL, Amit, KITTL, Jorge A

Volltext

A comparative study of the microstructure-dielectric properties of crystalline SrTiO3 ALD films obtained via seed layer approach von Popovici, Mihaela, Tomida, Kazuyuki, Swerts, Johan, Favia, Paola, Delabie, Annelies, Bender, Hugo, Adelmann, Christoph, Tielens, Hilde, Brijs, Bert, Kaczer, Ben, Pawlak, Malgorzata A., Kim, Min-Soo, Altimime, Laith, Van Elshocht, Sven, Kittl, Jorge A.

Volltext

Fast V Transients After the Program/Erase of Flash Memory Stacks With High- k Dielectrics von Toledano-Luque, María, Degraeve, Robin, Zahid, Mohammed B, Kaczer, Ben, Blomme, Pieter, Kittl, Jorge A, Jurczak, M, Van Houdt, Jan, Groeseneken, Guido

Volltext

Ni based silicides for 45 nm CMOS and beyond von Lauwers, Anne, Kittl, Jorge A., Van Dal, Mark J.H., Chamirian, Oxana, Pawlak, Malgorzata A., de Potter, Muriel, Lindsay, Richard, Raymakers, Toon, Pages, Xavier, Mebarki, Bencherki, Mandrekar, Tushar, Maex, Karen

Volltext

Controlled growth of rutile TiO2 by atomic layer deposition on oxidized ruthenium von Popovici, Mihaela, Swerts, Johan, Tomida, Kazuyuki, Radisic, Dunja, Kim, Min-Soo, Kaczer, Ben, Richard, Olivier, Bender, Hugo, Delabie, Annelies, Moussa, Alain, Vrancken, Christa, Opsomer, Karl, Franquet, Alexis, Pawlak, Malgorzata A., Schaekers, Marc, Altimime, Laith, Van Elshocht, Sven, Kittl, Jorge A.

Volltext

Atomic Layer Deposition of Gadolinium Aluminate using Gd(iPrCp)3, TMA, and O3 or H2O von Adelmann, Christoph, Pierreux, Dieter, Swerts, Johan, Dewulf, Daan, Hardy, An, Tielens, Hilde, Franquet, Alexis, Brijs, Bert, Moussa, Alain, Conard, Thierry, Van Bael, Marlies K., Maes, Jan W., Jurczak, Malgorzata, Kittl, Jorge A., Van Elshocht, Sven

Volltext

Modeling of Copper Diffusion in Amorphous Aluminum Oxide in CBRAM Memory Stack von Sankaran, Kiroubanand, Goux, Ludovic, Clima, Sergiu, Mees, Maarten, Kittl, Jorge A., Jurczak, Malgorzata, Altimime, Laith, Rignanese, Gian-Marco, Pourtois, Geoffrey

Volltext

A Monte Carlo study of the low resistance state retention of HfO x based resistive switching memory von Yu, Shimeng, Yin Chen, Yang, Guan, Ximeng, Philip Wong, H.-S., Kittl, Jorge A.

Volltext

Ni fully GermanoSilicide for gate electrode application in pMOSFETs with HfSiON gate dielectrics von Hong Yu Yu, Singanamalla, R., Simoen, E., Xiaoping Shi, Lauwers, A., Kittl, J.A., Van Elshocht, S., Kristin De Meyer, Absil, P., Jurczak, M., Biesemans, S.

Volltext

Ni fully silicided gates for 45nm CMOS applications von Kittl, Jorge A., Lauwers, Anne, Pawlak, Malgorzata A., van Dal, Mark J.H., Veloso, Anabela, Anil, K.G., Pourtois, Geoffrey, Demeurisse, Caroline, Schram, Tom, Brijs, Bert, de Potter, Muriel, Vrancken, Christa, Maex, Karen

Volltext

Modulation of the Schottky Barrier Height for CMOS advanced contacts von Menghini, Mariela A., Homm, Pia, Su, Chen-Yi, Kittl, Jorge A., Tomita, Ryuji, Hegde, Ganesh, Lee, Joon-Gon, Hyun, Sangjin, Bowen, Chris, Rodder, Mark.S., Afanas'ev, Valeri, Locquet, Jean-Pierre

Volltext

NiO Thin Films Synthesized by Atomic Layer Deposition using Ni(dmamb)2 and Ozone as Precursors von Antony Premkumar, Peter, Toeller, Michael, Adelmann, Christoph, Meersschaut, Johan, Franquet, Alexis, Richard, Olivier, Tielens, Hilde, Brijs, Bert, Moussa, Alain, Conard, Thierry, Bender, Hugo, Schaekers, Marc, Kittl, Jorge A., Jurczak, Malgorzata, Van Elshocht, Sven

Volltext

Impact of thermal treatment upon morphology and crystallinity of strontium titanate films deposited by atomic layer deposition von Popovici, Mihaela, Van Elshocht, Sven, Menou, Nicolas, Favia, Paola, Bender, Hugo, Rosseel, Erik, Swerts, Johan, Adelmann, Christoph, Vrancken, Christa, Moussa, Alain, Tielens, Hilde, Tomida, Kazuyuki, Pawlak, Malgorzata, Kaczer, Ben, Schoofs, Geert, Vandervorst, Wilfried, Wouters, Dirk J., Kittl, Jorge A.

Volltext

A comparative study of the microstructure–dielectric properties of crystalline SrTiO 3 ALD films obtained via seed layer approach von Popovici, Mihaela, Tomida, Kazuyuki, Swerts, Johan, Favia, Paola, Delabie, Annelies, Bender, Hugo, Adelmann, Christoph, Tielens, Hilde, Brijs, Bert, Kaczer, Ben, Pawlak, Malgorzata A., Kim, Min‐Soo, Altimime, Laith, Van Elshocht, Sven, Kittl, Jorge A.

Volltext