(Invited) The Past, Present and Future of High-k/Metal Gates von Choi, Kisik, Ando, Takashi, Cartier, Eduard A., Kerber, Andreas, Paruchuri, Vamsi, Iacoponi, John, Narayanan, Vijay

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Comparison of effective work function extraction methods using capacitance and current measurement techniques von Huang-Chun Wen, Rino Choi, Brown, G.A., BosckeBoscke, T., Matthews, K., Harris, H.R., Kisik Choi, Alshareef, H.N., Hongfa Luan, Bersuker, G., Majhi, P., Dim-Lee Kwong, Byoung Hun Lee

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Bias temperature instability in High-κ/metal gate transistors - Gate stack scaling trends von Krishnan, S., Narayanan, V., Cartier, E., Ioannou, D., Kai Zhao, Ando, T., Unoh Kwon, Linder, B., Stathis, J., Chudzik, M., Kerber, A., Kisik Choi

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Spin-dependent electron scattering in cobalt interconnects von Lanzillo, Nicholas A, Bhosale, Prasad, Lavoie, Christian, Dechene, Daniel J, Robison, Robert R, Choi, Kisik

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On Oxygen Deficiency and Fast Transient Charge-Trapping Effects in High- k Dielectrics von Huang-Chun Wen, Harris, H.R., Young, C.D., Hongfa Luan, Alshareef, H.N., Kisik Choi, Dim-Lee Kwong, Majhi, P., Bersuker, G., Byoung Hun Lee

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Remote epitaxy and freestanding wide bandgap semiconductor membrane technology von Park, Minseong, Maekawa, Takuji, Hwang, Kyungwook, Cable, Jim, Noriyuki, Watanabe, Choi, Kisik, Noh, Young-Kyun, Oh, Youngtek, Baek, Yongmin, Lee, Kyusang

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Origins of Effective Work Function Roll-Off Behavior for High-κ Last Replacement Metal Gate Stacks von Ando, Takashi, Cartier, Eduard A., Bruley, John, Choi, Kisik, Narayanan, Vijay

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BEOL Compatible High-Capacitance MIMCAP Structure Using a Novel High k Material von Jamison, Paul C., Massey, John, Ando, Takashi, Cartier, Eduard A., Jagannathan, Hemanth, Chen, P. J., Liu, Eric, Romero, Alex, Naczas, Sebastian, Narayanan, Vijay, Pancharatnam, Shanti, Restle, Phillip, Rubin, Joshua, Loubet, Nicolas J, Choi, Kisik

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Origins of Effective Work Function Roll-Off Behavior for High-[Formula Omitted] Last Replacement Metal Gate Stacks von Ando, Takashi, Cartier, Eduard A, Bruley, John, Choi, Kisik, Narayanan, Vijay

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Atomic layer deposition of HfxAlyCz as a work function material in metal gate MOS devices von Lee, Albert, Fuchigami, Nobi, Pisharoty, Divya, Hong, Zhendong, Haywood, Ed, Joshi, Amol, Mujumdar, Salil, Bodke, Ashish, Karlsson, Olov, Kim, Hoon, Choi, Kisik, Besser, Paul

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Tiered-profile contact for semiconductor von Choi, Kisik, Cheng, Kangguo

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Impact of Bottom Interfacial Layer on the Threshold Voltage and Device Reliability of Fluorine Incorporated PMOSFETS with High-K/Metal Gate von Kisik Choi, Taeho Lee, Barnett, J., Harris, H.R., Seungsoo Kweon, Young, C., Bersuker, G., Choi, R., Seung Chul Song, Byoung Hun Lee, Jammy, R.

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Atomic layer deposition of Hf{sub x}Al{sub y}C{sub z} as a work function material in metal gate MOS devices von Lee, Albert, Fuchigami, Nobi, Pisharoty, Divya, Hong, Zhendong, Haywood, Ed, Joshi, Amol, Mujumdar, Salil, Bodke, Ashish, Karlsson, Olov, Kim, Hoon, Choi, Kisik, Besser, Paul

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Mechanism of VFB/VTH shift in Dysprosium incorporated HfO2 gate dielectric n-Type Metal-Oxide-Semiconductor devices von Lee, Tackhwi, Choi, Kisik, Ando, Takashi, Park, Dae-Gyu, Gribelyuk, Michael A., Kwon, Unoh, Banerjee, Sanjay K.

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Mechanism of flatband voltage roll-off studied with Al 2 O 3 film depositedon terraced oxide von Choi, Kisik, Wen, Huang-Chun, Bersuker, Gennadi, Harris, Rusty, Lee, Byoung Hun

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Mechanism of flatband voltage roll-off studied with Al2O3 film deposited on terraced oxide von Choi, Kisik, Wen, Huang-Chun, Bersuker, Gennadi, Harris, Rusty, Lee, Byoung Hun

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Decoupling the Fermi-level pinning effect and intrinsic limitations on p-type effective work function metal electrodes von Wen, Huang-Chun, Majhi, Prashant, Choi, Kisik, Park, C.S., Alshareef, Husam N., Rusty Harris, H., Luan, Hongfa, Niimi, Hiro, Park, Hong-Bae, Bersuker, Gennadi, Lysaght, Patrick S., Kwong, Dim-Lee, Song, S.C., Lee, Byoung Hun, Jammy, Raj

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Tiered-Profile Contact for Semiconductor von Choi, Kisik, Cheng, Kangguo

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Tiered-profile contact for semiconductor von Choi, Kisik, Cheng, Kangguo

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Tiered-Profile Contact for Semiconductor von Choi, Kisik, Cheng, Kangguo

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