Plasma deposition of Si3N4 layers von Kirov, K.I., Georgiev, S.S., Pantchev, B.G., Koprinarova, J.B.

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Study of the Poole-Frenkel Effect in CdS Single Crystals von Kirov, K. I.

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A simple charge-based DLTS technique von Kirov, K. I., Radev, K. B.

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Some sources of error in interface state density evaluation from Q-U date in MOS systems von Kirov, K. I., Alexandrova, S. P.

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The Effect of Errors in Semiconductor Constants on the Interface State Density Determination in MOS Structures von Aleksandrova, S. P., Kirov, K. I.

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Investigation of MIS structures with Al2O3 insulation layers obtained by d.c. reactive sputtering von Kirov, K.I., Atanasova, E.D., Ivanov, N.A.

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Improved Detection of Common Variants Associated with Schizophrenia by Leveraging Pleiotropy with Cardiovascular-Disease Risk Factors von Andreassen, Ole A., Djurovic, Srdjan, Thompson, Wesley K., Schork, Andrew J., Kendler, Kenneth S., O’Donovan, Michael C., Rujescu, Dan, Werge, Thomas, van de Bunt, Martijn, Morris, Andrew P., McCarthy, Mark I., Roddey, J. Cooper, McEvoy, Linda K., Desikan, Rahul S., Dale, Anders M.

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Radiation induced changes in low-temperature oxide mos structures (Al-Si02Si) von Litovchenko, V. G., Kiblick, V. Ya, Georgiev, S. S., Kirov, K. I.

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Properties of SiO2 films formed by oxygen implantation into silicon von Kirov, K.I., Atanasova, E.D., Alexandrova, S.P., Amov, B.G., Djakov, A.E.

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The characteristics of a modified planar-magnetron sputtering source von Kirov, KI, Georgiev, SS, Ivanov, NA, Minchev, GM

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Formation of ultrathin oxide films on silicon in RF oxygen plasma von Atanasova, E. D., Kirov, K. I., Kantardjeva, E. I.

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Common polygenic variation contributes to risk of schizophrenia and bipolar disorder von Purcell, Shaun M, Wray, Naomi R, Stone, Jennifer L, Visscher, Peter M, O'Donovan, Michael C, Sullivan, Patrick F, Sklar, Pamela

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Some investigation of Si and SiO2 surfaces etched in CF4 or CF4O2 plasma von Atanasova, E. D., Kirov, K. I., Pantchev, B. G., Georgiev, S. S.

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Investigation of SiO2 layers deposited by plasma decomposition of tetra-ethoxy silane in a planar reactor von Kirov, K. I., Georgiev, S. S., Gerova, E. V., Aleksandrova, S. P.

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Investigation of Al2O3 layers obtained by DC planar-magnetron sputtering von Kirov, K. I., Atanasova, E. D., Ivanov, N. A.

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Rare chromosomal deletions and duplications increase risk of schizophrenia von Stone, Jennifer L., O'Donovan, Michael C., Gurling, Hugh, Kirov, George K., Blackwood, Douglas H. R., Corvin, Aiden, Craddock, Nick J., Gill, Michael, Hultman, Christina M., Lichtenstein, Paul, McQuillin, Andrew, Pato, Carlos N., Ruderfer, Douglas M., Owen, Michael J., St Clair, David, Sullivan, Patrick F., Sklar, Pamela, Purcell, Shaun M.

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Amorphous to crystalline state conversion in deposited silicon layers von Kalitzova, M. G., Simov, S. B., Pantchev, B. G., Danesh, P., Kirov, K. I., Djakov, A. E.

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Schizophrenia susceptibility alleles are enriched for alleles that affect gene expression in adult human brain von Richards, A L, Jones, L, Moskvina, V, Kirov, G, Gejman, P V, Levinson, D F, Sanders, A R, Purcell, S, Visscher, P M, Craddock, N, Owen, M J, Holmans, P, O'Donovan, M C

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Molecular pathways involved in neuronal cell adhesion and membrane scaffolding contribute to schizophrenia and bipolar disorder susceptibility von O'Dushlaine, C, Kenny, E, Heron, E, Donohoe, G, Gill, M, Morris, D, Corvin, A

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Additive Genetic Variation in Schizophrenia Risk Is Shared by Populations of African and European Descent von de Candia, Teresa R., Lee, S. Hong, Yang, Jian, Browning, Brian L., Gejman, Pablo V., Levinson, Douglas F., Mowry, Bryan J., Hewitt, John K., Goddard, Michael E., O’Donovan, Michael C., Purcell, Shaun M., Posthuma, Danielle, Visscher, Peter M., Wray, Naomi R., Keller, Matthew C.

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