Process Window Centering for 22 nm Lithography von Buengener, Ralf, Boye, Carol, Rhoads, Bryan N, Chong, Sang Y, Tejwani, Charu, Burns, Sean D, Stamper, Andrew D, Nafisi, Kourosh, Brodsky, Colin J, Fan, Susan S, Kini, Sumanth, Hahn, Roland

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Process Window Centering for 22 nm lithography von Buengener, Ralf, Boye, C, Rhoads, B N, Chong, S Y, Tejwani, C, Burns, S D, Stamper, A D, Nafisi, K, Brodsky, C J, Fan, S S, Kini, S, Hahn, R

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Optimization of pitch-split double patterning phoresist for applications at the 16nm node von Holmes, S. J., Tang, C., Burns, S., Yunpeng Yin, Chen, R., Chiew-seng Koay, Kini, S., Tomizawa, H., Shyng-Tsong Chen, Fender, N., Osborn, B., Singh, L., Petrillo, K., Landie, G., Halle, S., Sen Liu, Arnold, J. C., Spooner, T., Varanasi, R., Slezak, M., Colburn, M., Dunn, S., Hetzer, D., Kawakami, S., Cantone, J.

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Defectivity Characterization of post-CMP Voiding in 32nm Cu Metallization von Boye, C.A., Kelly, J.J., Canaperi, D.

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Human dirofilariasis: an emerging zoonosis in India von Kini, Reshma G., Leena, J. B., Shetty, Prathvi, Lyngdoh, Raphael Hart, Sumanth, D., George, Lovely

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Warthin tumor with extensive squamous and mucinous metaplasia: Pathologist′s dilemma von Leena, JB, Kini, ReshmaG, Devaraju, Sumanth, Ali, SubhanR

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