Phenol‐Derived Carbon Sealant Inspired by a Coalification Process von Lee, Yunhan, Jun, Kiwoo, Lee, Kyueui, Seo, Young Chang, Jeong, Changyoung, Kim, Munja, Oh, Il‐Kwon, Lee, Haeshin

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Phenol‐Derived Carbon Sealant Inspired by a Coalification Process von Lee, Yunhan, Jun, Kiwoo, Lee, Kyueui, Seo, Young Chang, Jeong, Changyoung, Kim, Munja, Oh, Il‐Kwon, Lee, Haeshin

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Methods of manufacturing pellicles having graphite layers von Kim Byunggook, Choi Jaehyuck, Kim Munja

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METHODS OF MANUFACTURING PELLICLES HAVING GRAPHITE LAYERS von KIM MUNJA, KIM BYUNGGOOK, CHOI JAEHYUCK

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Pellicle for preventing thermal accumulation and extreme ultra-violet lithography apparatus having the same von Choi, Jaehyuck, Jung, Yongseok, Chalykh, Roman, Kim, Byunggook, Kim, Munja, Kwon, Sungwon, Jeon, Hwanchul

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PELLICLE FOR PREVENTING THERMAL ACCUMULATION AND EXTREME ULTRA-VIOLET LITHOGRAPHY APPARATUS HAVING THE SAME von KIM, Byunggook, CHALYKH, Roman, KIM, Munja, JUNG, Yongseok, KWON, Sungwon, CHOI, Jaehyuck, JEON, Hwanchul

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Pellicle for preventing thermal accumulation and extreme ultra-violet lithography apparatus having the same von Choi, Jaehyuck, Jung, Yongseok, Chalykh, Roman, Kim, Byunggook, Kim, Munja, Kwon, Sungwon, Jeon, Hwanchul

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Methods of fabricating pellicles using supporting layer von Kim Sooyoung, Shin Dong-Wook, Kim Seul-Gi, Kim Taesung, Jeon Hwanchul, Kim Munja, Yoo Ji-Beom

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PELLICLE FOR PREVENTING THERMAL ACCUMULATION AND EXTREME ULTRA-VIOLET LITHOGRAPHY APPARATUS HAVING THE SAME von JUNG Yongseok, KIM Munja, CHOI Jaehyuck, KWON Sungwon, CHALYKH Roman, JEON Hwanchul, KIM Byunggook

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Pellicle for preventing thermal accumulation von KWON, SUNGWON, JEON, HWANCHUL, KIM, BYUNGGOOK, CHALYKH, ROMAN, KIM, MUNJA, CHOI, JAEHYUCK, JUNG, YONGSEOK

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METHODS OF FABRICATING PELLICLES USING SUPPORTING LAYER von KIM SOOYOUNG, KIM TAESUNG, SHIN DONG-WOOK, KIM MUNJA, KIM SEUL-GI, JEON HWANCHUL, YOO JI-BEOM

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An epidemiological study of HBvirus markers in Korean people in Hyogo prefecture von KIM, Suryang, RYANG, Muguan, So, Changgyo, KANG, Kyongbu, KOH, Kwangjun, RYANG, Sunchik, SIN, Ryoungun, KIM, Munja, UBUKATA, Takashi, TSUDA, Fumio

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Pellicle For Preventing Thermal Accumulation And Extreme Ultra-violet Lithography Apparatus Having The Same von BYUNGGOOK KIM, YONGSEOK JUNG, HWANCHUL JEON, MUNJA KIM, ROMAN CHALYKH, SUNGWON KWON, JAEHYUCK CHOI

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