Hyperspectral retrievals of suspended sediment using cluster-based machine learning regression in shallow waters von Kwon, Siyoon, Seo, Il Won, Noh, Hyoseob, Kim, Byunguk

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The effect of an annealing process on atomic layer deposited TiO2 thin films von Kim, Byunguk, Kang, Taeseong, Lee, Gucheol, Jeon, Hyeongtag

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Surrogate prediction of the breakthrough curve of solute transport in rivers using its reach length dependence von Kim, Byunguk, Kwon, Siyoon, Noh, Hyoseob, Seo, Il Won

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Estimating Net Retention Time of Solute in Storage Zones of a Stream von Kim, Byunguk, Seo, Il Won, Kwon, Siyoon, Baek, Donghae

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Controlling tin oxysulfide thin film compositions and electronic band structures using atomic layer deposition and vacuum annealing process von Choi, Yeonsik, Kim, Byunguk, Lee, Dow-wook, Jeon, Hyeongtag

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The effect of an annealing process on atomic layer deposited TiO 2 thin films von Kim, Byunguk, Kang, Taeseong, Lee, Gucheol, Jeon, Hyeongtag

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Corrigendum: The effect of an annealing process on atomic layer deposited TiO 2 thin films (2022 Nanotechnology 33 045705) von Kim, Byunguk, Kang, Taeseong, Lee, Gucheol, Jeon, Hyeong tag

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Deposition of the tin sulfide thin films using ALD and a vacuum annealing process for tuning the phase transition von Choi, Yeonsik, Park, Hyunwoo, Lee, Namgue, Kim, Byunguk, Lee, Junghoon, Lee, Gucheol, Jeon, Hyeongtag

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Non-spectral linear depth inversion using drone-acquired wave field imagery von Kim, Byunguk, Noh, Hyoseob, Park, Yong Sung, Lee, Minjae

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An Explicit Solution for Characterizing Non-Fickian Solute Transport in Natural Streams von Kim, Byunguk, Kwon, Siyoon, Seo, Il Won

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Modelling one-dimensional reactive transport of toxic contaminants in natural rivers von Kim, Byunguk, Seo, Il Won, Kwon, Siyoon, Jung, Sung Hyun, Choi, Yongju

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Remote plasma enhanced atomic layer deposition of titanium nitride film using metal organic precursor (C12H23N3Ti) and N-2 plasma von Kim, Byunguk, Lee, Namgue, Lee, Junghoon, Park, Taehun, Park, Hyunwoo, Kim, Youngjoon, Jin, Changhyun, Lee, Dahyun, Kim, Hohoon, Jeon, Hyeongtag

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Remote plasma enhanced atomic layer deposition of titanium nitride film using metal organic precursor (C12H23N3Ti) and N2 plasma von Kim, Byunguk, Lee, Namgue, Lee, Junghoon, Park, Taehun, Park, Hyunwoo, Kim, Youngjoon, Jin, Changhyun, Lee, Dahyun, Kim, Hohoon, Jeon, Hyeongtag

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Atomic layer deposition for rutile structure TiO2 thin films using a SnO2 seed layer and low temperature heat treatment von Kim, Byunguk, Choi, Yeonsik, Lee, Dahyun, Cheon, Seonghak, Byun, Younghun, Jeon, Hyeongtag

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Atomic layer deposition of MoNx thin films using a newly synthesized liquid Mo precursor von Kim, Byunguk, Lee, Sangmin, Kang, Taesung, Kim, Sunghoon, Koo, Sangman, Jeon, Hyeongtag

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Atomic layer deposition for rutile structure TiO 2 thin films using a SnO 2 seed layer and low temperature heat treatment von Kim, Byunguk, Choi, Yeonsik, Lee, Dahyun, Cheon, Seonghak, Byun, Younghun, Jeon, Hyeongtag

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Atomic layer deposition of titanium dioxide films using a metal organic precursor (C12H23N3Ti) and H2O (DI water) von Kim, Byunguk, Lee, Namgue, Park, Suhyeon, Park, Taehun, Song, Jaiwon, Han, Seungwook, Park, Hyunwoo, Lee, Dahyun, Kim, Hohoon, Jeon, Hyeongtag

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Corrigendum to “Atomic layer deposition of titanium dioxide films using a metal organic precursor (C12H23N3Ti) and H2O (DI water)” [J. Alloy. Compd. 857 (2021) 157931] von Kim, Byunguk, Lee, Namgue, Park, Suhyeon, Park, Taehun, Song, Jaiwon, Han, Seungwook, Park, Hyunwoo, Lee, Dahyun, Kim, Hohoon, Jeon, Hyeongtag

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The influence of density difference, discharge ratio and wind on the mixing at large river confluence von Lee, Minjae, Park, Yong Sung, Ko, Joo Suk, Choi, Suhyeok, Lyu, Siwan, Kim, Byunguk

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Leakage Current Characteristics of Atomic Layer Deposited Al-Doped TiO2 Thin Film for Dielectric in DRAM Capacitor von Kim, Byunguk, Choi, Yeonsik, Lee, Dahyun, Byun, Younghun, Jung, Chanwon, Jeon, Hyeongtag

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