A study of the effects of nitrogen incorporation and annealing on the properties of hydrogenated amorphous carbon films von Khan, R.U.A., Burden, A.P., Silva, S.R.P., Shannon, J.M., Sealy, B.J.

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Molecularly ordered aluminum tris-(8-hydroxyquinoline) thin films grown by hot-wall deposition von Tapponnier, A., Khan, R.U.A., Marcolli, C., Günter, P.

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A review of the effects of carbon self-implantation into amorphous carbon von Khan, R.U.A., Silva, S.R.P.

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Studies of carbon ion self-implantation into hydrogenated amorphous carbon films von Khan, R.U.A., Grambole, D., Silva, S.R.P.

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Ion-implantation into amorphous hydrogenated carbon films von Khan, R.U.A, Anguita, J.V, Silva, S.R.P

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Switching phenomena in boron-implanted amorphous carbon films von Khan, R.U.A., Silva, S.R.P.

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Tailoring of the field emission properties of hydrogenated amorphous carbon thin films by nitrogen incorporation and thermal annealing von Forrest, R.D., Khan, R.U.A., Silva, S.R.P.

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Electron paramagnetic resonance study of ion implantation induced defects in amorphous hydrogenated carbon von Jones, B.J., Barklie, R.C., Khan, R.U.A., Carey, J.D., Silva, S.R.P.

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Growth and characterisation of amorphous carbon films doped with nitrogen von Barradas, N.P., Khan, R.U.A., Anguita, J.V., Silva, S.R.P., Kreissig, U., Grötzschel, R., Möller, W.

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The microstructural dependence of the opto-electronic properties of nitrogenated hydrogenated amorphous carbon thin films von SILVA, S. R. P, KHAN, R. U. A, BURDEN, A. P, ANGUITA, J. V, SHANNON, J. M, SEALY, B. J, PAPWORTH, A. J, KIELY, C. J, AMARATUNGA, G. A. J

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Electron field emission from amorphous carbon thin films as a function of annealing von Forrest, R.D., Burden, A.P., Khan, R.U.A., Silva, S.R.P.

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