Complementary model for intrinsic time-dependent dielectric breakdown in SiO2 dielectrics von McPherson, J. W., Khamankar, R. B., Shanware, A.

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Molecular model for intrinsic time-dependent dielectric breakdown in SiO2 dielectrics and the reliability implications for hyper-thin gate oxide von McPherson, J W, Khamankar, R B

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Morphology and integration of rough polycrystalline silicon films for DRAM storage cell applications von BANERJEE, A, CRENSHAW, D. L, WISE, R. L, KHAMANKAR, R. B, PAS, M. F

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Effects of electrical stress parameters on polarization loss in ferroelectric P(L)ZT thin film capacitors von Khamankar, R.B., Jiyoung Kim, Sudhama, C., Bo Jiang, Lee, J.C.

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A complementary molecular-model (including field and current) for TDDB in SiO2 dielectrics von McPherson, J.W., Khamankar, R.B., Shanware, A.

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Molecular model for intrinsic time-dependent dielectric breakdown in SiO 2 dielectrics and the reliability implications for hyper-thin gate oxide von McPherson, J W, Khamankar, R B

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Material dependence of hydrogen diffusion: implications for NBTI degradation von Krishnan, A.T., Chancellor, C., Chakravarthi, S., Nicollian, P.E., Reddy, V., Varghese, A., Khamankar, R.B., Krishnan, S.

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A novel BST storage capacitor node technology using platinum electrodes for Gbit DRAMs von Khamankar, R.B., Kressley, M.A., Visokay, M.R., Moise, T., Xing, G., Nemoto, S., Okumo, Y., Fang, S.J., Wilson, A.M., Gaynor, J.F., Hurd, T.Q., Crenshaw, D.L., Summerfelt, S., Colombo, L.

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Seasonal variations in ostracod species in two freshwater lakes in Yavatmal District (Maharashtra) India von Kuchankar, Sonal W., Kamdi, Ramdas R., Patel, Paresh R., Khamankar, Dnyaneshwar B.

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Evaluation of nutritive value of local fishes in Wani region, Dist. Yavatmal, (Maharashtra) von Khamankar, D.B., Kamdi, R R, Sawane, A P

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Ichthyofaunal diversity of Wardha river and Nirguda river in selected stretch of Wani, Dist. Yeotmal, (M.S.), India von Khamankar, D.B., Kamdi, R.R., Sawane, A.P.

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Effects of nonlinear storage capacitor on DRAM READ/WRITE von Bo Jiang, Sudhama, C., Khamankar, R., Jiyoung Kim, Lee, J.C.

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A designer friendly 45nm high performance technology with in-situ C-doped e-SiGe & dual stress liner in SRAM von Khamankar, R., Bowen, C., Bu, H., Corum, D., Fujii, I., Gu, Y., Hornung, B., Kim, T., Kirkpatrick, B., Kirmse, K., Krishnan, A., Lin, C., Liu, L., Lowry, T., Montgomery, C., Olubuyide, O., Prins, S., Riley, D., Yu, S., Blatchford, J., Machala, C., O'Brien, C., Shinn, G., Grider, T.

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NITROGEN BASED IMPLANTS FOR DEFECT REDUCTION IN STRAINED SILICON von KHAMANKAR, Rajesh, CHIDAMBARAM, P, R, CHAKRAVARTHI, Srinivasan, GRIDER, Douglas, T, BU, Haowen

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Measurement of mobile ion contamination in multilayer metallization by triangular voltage sweep von Chonko, M A, Khamankar, R, Tiwald, T, Allen, T, Vasquez, B

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Nonlinearity of ferroelectric capacitors on dram R/W operations von Lee, Jack C., Jiang, Bo, Sudhama, C., Khamankar, Rajesh, Kim, Jiyoung

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Nitrogen based implants for defect reduction in strained silicon von KHAMANKAR RAJESH, BU HAOWEN, CHIDAMBARAM P R, CHAKRAVARTHI SRINIVASAN, GRIDER DOUGLAS T

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Methods, systems and structures for forming semiconductor structures incorporating high-temperature processing steps von BU HAOWEN, KHAMANKAR RAJESH, CHIDAMBARAM P R, GRIDER DOUGLAS T

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Nitrogen Based Implants for Defect Reduction in Strained Silicon von CHIDAMBARAM PR, KHAMANKAR RAJESH, BU HAOWEN, CHAKRAVARTHI SRINIVASAN, GRIDER DOUGLAS T

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Nitrogen based implants for defect reduction in strained silicon von CHIDAMBARAM PR, KHAMANKAR RAJESH, BU HAOWEN, CHAKRAVARTHI SRINIVASAN, GRIDER DOUGLAS T

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