Gate length dependent polysilicon depletion effects von Chang-Hoon Choi, Chidambaram, P.R., Khamankar, R., Machala, C.F., Zhiping Yu, Dutton, R.W.

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Morphology and integration of rough polycrystalline silicon films for DRAM storage cell applications von BANERJEE, A, CRENSHAW, D. L, WISE, R. L, KHAMANKAR, R. B, PAS, M. F

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Effects of electrical stress parameters on polarization loss in ferroelectric P(L)ZT thin film capacitors von Khamankar, R.B., Jiyoung Kim, Sudhama, C., Bo Jiang, Lee, J.C.

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Effects of nonlinear storage capacitor on DRAM READ/WRITE von Bo Jiang, Sudhama, C., Khamankar, R., Jiyoung Kim, Lee, J.C.

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Thickness-scaling of sputtered PZT films in the 200 nm range for memory applications von SUDHAMA, C, KIM, J, KHAMANKAR, R, CHIKARMANE, V, LEE, J. C

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Molecular model for intrinsic time-dependent dielectric breakdown in SiO 2 dielectrics and the reliability implications for hyper-thin gate oxide von McPherson, J W, Khamankar, R B

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Material dependence of hydrogen diffusion: implications for NBTI degradation von Krishnan, A.T., Chancellor, C., Chakravarthi, S., Nicollian, P.E., Reddy, V., Varghese, A., Khamankar, R.B., Krishnan, S.

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A designer friendly 45nm high performance technology with in-situ C-doped e-SiGe & dual stress liner in SRAM von Khamankar, R., Bowen, C., Bu, H., Corum, D., Fujii, I., Gu, Y., Hornung, B., Kim, T., Kirkpatrick, B., Kirmse, K., Krishnan, A., Lin, C., Liu, L., Lowry, T., Montgomery, C., Olubuyide, O., Prins, S., Riley, D., Yu, S., Blatchford, J., Machala, C., O'Brien, C., Shinn, G., Grider, T.

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Measurement of mobile ion contamination in multilayer metallization by triangular voltage sweep von Chonko, M A, Khamankar, R, Tiwald, T, Allen, T, Vasquez, B

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A novel BST storage capacitor node technology using platinum electrodes for Gbit DRAMs von Khamankar, R.B., Kressley, M.A., Visokay, M.R., Moise, T., Xing, G., Nemoto, S., Okumo, Y., Fang, S.J., Wilson, A.M., Gaynor, J.F., Hurd, T.Q., Crenshaw, D.L., Summerfelt, S., Colombo, L.

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Reliability evaluation of HfSiON gate dielectric film with 12.8 /spl Aring/ SiO/sub 2/ equivalent thickness von Shanware, A., McPherson, J., Visokay, M.R., Chambers, J.J., Rotondaro, A.L.P., Bu, H., Bevan, M.J., Khamankar, R., Colombo, L.

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60nm gate length dual-Vt CMOS for high performance applications von MEHROTRA, M, WU, J, OLSEN, L, DELOACH, J, MEHIGAN, J, AGARWAL, R, WALSH, S, SEKEL, D, TSUNG, L, VAIDYANATHAN, M, TRENTMAN, B, LIU, K, JAIN, A, AUR, S, KHAMANKAR, R, NICOLLIAN, P, JIANG, Q, XU, Y, CAMPBELL, B, TINER, P, WISE, R, SCOTT, D, RODDER, M, LAAKSONEN, T, KIM, K, BATHER, W, KOSHY, R, CHEN, J, JACOBS, J, UKRAINTSEV, V

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A high performance 90 nm logic technology with a 37 nm gate length, dual plasma nitrided gate dielectric and differential offset spacer von Hornung, B., Bevan, M., Nicollian, P., Chidambaram, P.R., Chakravarthi, S., Gurba, A., Zhang, X., Blatchford, J., Smith, B., Lu, J.P., Deloach, J., Khamankar, R., Rathsack, B., Bowen, C., Thakar, G., Machala, C., Grider, T., Niimi, H., Goodwin, M., Robertson, L., Miles, D., Kirkpatrick, B., AlShareef, H., Varghese, A.

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Seasonal variations in ostracod species in two freshwater lakes in Yavatmal District (Maharashtra) India von Kuchankar, Sonal W., Kamdi, Ramdas R., Patel, Paresh R., Khamankar, Dnyaneshwar B.

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A novel low-temperature process for high dielectric constant BST thin films for ULSI DRAM applications von Khamankar, R., Jiang, B., Tsu, R., Hsu, W.-Y., Nulman, J., Summerfelt, S., Anthony, M., Lee, J.

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NITROGEN BASED IMPLANTS FOR DEFECT REDUCTION IN STRAINED SILICON von KHAMANKAR, Rajesh, CHIDAMBARAM, P, R, CHAKRAVARTHI, Srinivasan, GRIDER, Douglas, T, BU, Haowen

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Nitrogen based implants for defect reduction in strained silicon von KHAMANKAR RAJESH, BU HAOWEN, CHIDAMBARAM P R, CHAKRAVARTHI SRINIVASAN, GRIDER DOUGLAS T

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Nitrogen based implants for defect reduction in strained silicon von Chakravarthi, Srinivasan, Chidambaram, P R, Khamankar, Rajesh, Bu, Haowen, Grider, Douglas T

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Base specific chemicals and mutation analysis in Lycopersicon von Jain, H K, Raut, R N, Khamankar, Y G

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Gate structure and method von Rotondaro, Antonio L. P, Colombo, Luigi, Visokay, Mark R, Khamankar, Rajesh, Mercer, Douglas E

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