Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization von Vervuurt, René H. J, Karasulu, Bora, Verheijen, Marcel A, Kessels, Wilhelmus (Erwin) M. M, Bol, Ageeth A

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Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle von Mameli, Alfredo, Merkx, Marc J. M, Karasulu, Bora, Roozeboom, Fred, Kessels, Wilhelmus (Erwin) M. M, Mackus, Adriaan J. M

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Area-selective atomic layer deposition of platinum using photosensitive polyimide von Vervuurt, René H J, Sharma, Akhil, Jiao, Yuqing, Kessels, Wilhelmus (Erwin) M M, Bol, Ageeth A

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Foundations of atomic-level plasma processing in nanoelectronics von Arts, Karsten, Hamaguchi, Satoshi, Ito, Tomoko, Karahashi, Kazuhiro, Knoops, Harm C M, Mackus, Adriaan J M, (Erwin) Kessels, Wilhelmus M M

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MoS2 Synthesized by Atomic Layer Deposition as Cu Diffusion Barrier von Deijkers, Johanna (Sanne) H., Jong, Arthur A., Mattinen, Miika J., Schulpen, Jeff J. P. M., Verheijen, Marcel A., Sprey, Hessel, Maes, Jan Willem, Kessels, Wilhelmus (Erwin) M. M., Bol, Ageeth A., Mackus, Adriaan J. M.

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Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3 von Chittock, Nicholas J., Vos, Martijn F. J., Faraz, Tahsin, Kessels, Wilhelmus M. M. (Erwin), Knoops, Harm C. M., Mackus, Adriaan J. M.

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Status and prospects of plasma-assisted atomic layer deposition von Knoops, Harm C. M., Faraz, Tahsin, Arts, Karsten, Kessels, Wilhelmus M. M. (Erwin)

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Optimization of the efficiency of a nanowire solar cell by nanowire tapering von Bochicchio, Emanuele, Korzun, Ksenia, Dubach, Friso, van Gorkom, Bas T., Theeuwes, Roel J., (Erwin) Kessels, Wilhelmus M. M., Rivas, Jaime Gómez, Haverkort, Jos E. M.

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Excellent surface passivation of germanium by a-Si:H/Al2O3 stacks von Berghuis, Wilhelmus J. H. (Willem-Jan), Melskens, Jimmy, Macco, Bart, Theeuwes, Roel J., Black, Lachlan E., Verheijen, Marcel A., Kessels, Wilhelmus M. M. (Erwin)

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Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers von Starostin, Sergey A., Keuning, Wytze, Schalken, Jean-Paul, Creatore, Mariadriana, Kessels, Wilhelmus M. M. (Erwin), Bouwstra, Jan B., (Richard) van de Sanden, Mauritius C. M., de Vries, Hindrik W.

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Atomic layer deposition and selective etching of ruthenium for area-selective deposition: Temperature dependence and supercycle design von Vos, Martijn F. J., Chopra, Sonali N., Ekerdt, John G., Agarwal, Sumit, Kessels, Wilhelmus M. M. (Erwin), Mackus, Adriaan J. M.

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Pt–Graphene Contacts Fabricated by Plasma Functionalization and Atomic Layer Deposition von Vervuurt, René H. J., Karasulu, B., Thissen, Nick F. W., Jiao, Yuqing, Weber, Jan‐Willem, Kessels, Wilhelmus (Erwin) M. M., Bol, Ageeth A.

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Extracting surface recombination parameters of germanium–dielectric interfaces by corona-lifetime experiments von Berghuis, Wilhelmus J. H. (Willem-Jan), Helmes, Max, Melskens, Jimmy, Theeuwes, Roel J., Kessels, Wilhelmus M. M. (Erwin), Macco, Bart

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Equivalent electric circuit model of accurate ion energy control with tailored waveform biasing von Yu, Qihao, Lemmen, Erik, Vermulst, Bas, Mackus, Adriaan J M, (Erwin) Kessels, Wilhelmus M M, Wijnands, Korneel

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The chemistry and energetics of the interface between metal halide perovskite and atomic layer deposited metal oxides von Bracesco, Andrea E. A., Burgess, Claire H., Todinova, Anna, Zardetto, Valerio, Koushik, Dibyashree, Kessels, Wilhelmus M. M (Erwin), Dogan, Ilker, Weijtens, Christ H. L., Veenstra, Sjoerd, Andriessen, Ronn, Creatore, Mariadriana

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Atomic Layer Deposition for Graphene Device Integration von Vervuurt, René H. J., Kessels, Wilhelmus M. M. (Erwin), Bol, Ageeth A.

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Thickness and Morphology Dependent Electrical Properties of ALD‐Synthesized MoS2 FETs von Mahlouji, Reyhaneh, Verheijen, Marcel A., Zhang, Yue, Hofmann, Jan P., Kessels, Wilhelmus. M. M.(Erwin), Bol, Ageeth A.

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Area-Selective Atomic Layer Deposition of SiO 2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle von Mameli, Alfredo, Merkx, Marc J M, Karasulu, Bora, Roozeboom, Fred, Kessels, Wilhelmus Erwin M M, Mackus, Adriaan J M

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Uniform Atomic Layer Deposition of Al 2 O 3 on Graphene by Reversible Hydrogen Plasma Functionalization von Vervuurt, René H J, Karasulu, Bora, Verheijen, Marcel A, Kessels, Wilhelmus Erwin M M, Bol, Ageeth A

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ALD-grown two-dimensional TiSx metal contacts for MoS2 field-effect transistors von Mahlouji, Reyhaneh, Kessels, Wilhelmus M M Erwin, Sagade, Abhay A, Bol, Ageeth A

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