Coupling Supramolecular Assemblies and Reactive Oxygen Species (ROS) with Megasonic Action for Applications in Shallow Trench Isolation (STI) Post-Chemical Mechanical Planarization... von Wortman-Otto, Katherine M., Watson, Don, Dussault, Don, Keleher, Jason J.

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Slurry Activation for Enhanced Surface Redox Reactions in CMP von Philipossian, Ara, Redeker, Fritz, Keleher, Jason J., Cahue, Kiana A., Sampurno, Yasa

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Evaluation of the catalytic decomposition of H2O2 through use of organo-metallic complexes – A potential link to the luminol presumptive blood test von Soderquist, Thomas J., Chesniak, Olivia M., Witt, Matthew R., Paramo, Alan, Keeling, Victoria A., Keleher, Jason J.

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Striking a balance: Role of supramolecular assemblies on the modulation of the chemical and mechanical contributions during Post-STI CMP cleaning von Graverson, Carolyn F., Wortman-Otto, Katherine M., Linhart, Abigail N., Sampurno, Yasa, Philipossian, Ara, Keleher, Jason J.

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Design of “Soft” Cleaning Processes for Emerging Substrates via Stimuli Responsive Chemistry von Caridi, Adam T., Cahue, Kiana A., Powell, Joseph L., Smith, Piper M., Gentile, Ryan J., Keleher, Jason J.

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Tribological Characterization of Anionic Supramolecular Assemblies in Post-STI-CMP Cleaning Solution Using a Novel Post-CMP PVA Brush Scrubber von Philipossian, Ara, Wortman-Otto, Katherine M., Sudargho, Fransisca, Graverson, Carolyn, Sampurno, Yasa, Keleher, Jason J., Theng, Sian

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Harnessing Fe(III)–Carboxylate Photochemistry for Radical-Initiated Polymerization in Hydrogels von Karunarathna, M. H. Jayan S, Linhart, Abigail N, Giammanco, Giuseppe E, Norton, Amie E, Chory, Jackson J, Keleher, Jason J, Ostrowski, Alexis D

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Strategic Design of Antimicrobial Hydrogels Containing Biomimetic Additives for Enhanced Matrix Responsiveness and HDFa Wound Healing Rates von Linhart, Abigail N, Wortman-Otto, Katherine M, Deninger, Ian, Dudek, Abigail L, Lange, Heather R, Danhausen, Dany M, Graverson, Carolyn F, Beckmann, Thomas J, Havens, Mallory A, Keleher, Jason J

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Evaluation of a Photosensitizer Redox Couple for Oxide Removal Rate Tunability in Shallow Trench Isolation Chemical Mechanical Planarization von Linhart, Abigail N., Wortman-Otto, Katherine M., Keleher, Jason J.

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Utilizing an α,β-Unsaturated Dicarboxylic Acid for a Defect Initiated Residue Removal During Cu post-Chemical Mechanical Planarization Cleaning von Dudek, Abigail L., Cahue, Kiana A., Caridi, Adam T., Cahue, Tatiana R., Keleher, Jason J.

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Role of Molecular Structure on Modulating the Interfacial Dynamics for Shallow Trench Isolation (STI) Chemical Mechanical Planarization (CMP) Applications von Wortman-Otto, Katherine M., Linhart, Abigail N., Dudek, Abigail L., Sherry, Brian M., Keleher, Jason J.

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Development of "Soft" Cleaning Chemistries for Enhanced STI Post-CMP Cleaning von Graverson, Carolyn F., Wortman-Otto, Katherine M., Linhart, Abigail N., Zubi, Tala B., Keleher, Jason J.

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Design of “Low Stress” Post-CMP Cleaning Processes for Advanced Technology Nodes von Cahue, Kiana A., Dudek, Abigail L., Miliauskas, Mantas M., Cahue, Tatiana R., Mlynarski, Amy, Keleher, Jason J.

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Contact Vs. Non-Contact Cleaning: Correlating Interfacial Reaction Mechanisms to Processing Methodologies for Enhanced FEOL/BEOL Post-CMP Cleaning von Wortman-Otto, Katherine M., Linhart, Abigail N., Keleher, Jason J., Mikos, Allie M., Cahue, Kiana A.

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Development of a Student-Centered Environmental Design Competition Focusing on Water Desalination and Purification von Mlynarski, Amy L., Keleher, Jason J.

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Contact VsNon-Contact Cleaning: Correlating Interfacial Reaction Mechanisms to Processing Methodologies for Enhanced FEOL/BEOL Post-CMP Cleaning von Wortman-Otto, Katherine M, Linhart, Abigail N, Mikos, Allie M, Cahue, Kiana A, Keleher, Jason J

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Synergistic Effect of Pad "Macroporous-Reactors" on Passivation Mechanisms to Modulate Cu Chemical Mechanical Planarization (CMP) Performance von Wortman-Otto, Katherine M., Graverson, Carolyn F., Linhart, Abigail N., McDonough, Rose K., Mlynarski, Amy L., Keleher, Jason J.

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Relationship Between Molecular Structure and Removal Rates during Chemical Mechanical Planarization: Comparison of Benzotriazole and 1,2,4-Triazole von Stewart, Karen L., Keleher, Jason J., Gewirth, Andrew A.

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Interaction Between Triblock Copolymer Surfactant and Low-κ Dielectric Surfaces Relevant to CMP von Buthker, Joseph W., Keleher, Jason J., Gewirth, Andrew A.

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(Dielectric Science and Technology Poster Award, 2nd Place) Activation of Amine Chemistries for the Enhanced Particle Removal Efficiency of CeO2 Nanoparticles Via Megasonic Process... von McDonnell, Elizabeth Maeve, Keleher, Jason J.

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