Etch stop of silicon surface induced by tribo-nanolithography von Kawasegi, Noritaka, Morita, Noboru, Yamada, Shigeru, Takano, Noboru, Oyama, Tatsuo, Ashida, Kiwamu

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Tribonanolithography of silicon in aqueous solution based on atomic force microscopy von Park, Jeong Woo, Kawasegi, Noritaka, Morita, Noboru, Lee, Deug Woo

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Characteristics of mask layer on (1 0 0) silicon induced by tribo-nanolithography with diamond tip cantilevers based on AFM von Park, J.W., Lee, S.S., So, B.S., Jung, Y.H., Kawasegi, N., Morita, N., Lee, D.W.

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Ion-beam lithography by use of highly charged Ar-ion beam von Momota, Sadao, Iwamitsu, Shingo, Goto, Shougo, Nojiri, Yoichi, Taniguchi, Jun, Miyamoto, Iwao, Ohno, Hirohisa, Morita, Noboru, Kawasegi, Noritaka

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Nanoscale fabrication in aqueous KOH solution using tribo-nanolithography von Kawasegi, Noritaka, Park, Jeong Woo, Morita, Noboru, Yamada, Shigeru, Takano, Noboru, Oyama, Tatsuo, Ashida, Kiwamu

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