Atomic layer epitaxy of III–V compounds in a hydride vapor phase system von Ahopelto, J., Kattelus, H.P., Saarilahti, J., Suni, I.

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Thin-Film Capacitors with Tantalum-Hafnium Oxide Nanolaminate Insulator von Kattelus, H.P., Ronkainen, H., Kanniainen, T., Skarp, J.

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Characterization of reacted ohmic contacts to GaAs von Kattelus, H.P., Tandon, J.L., Nicolet, M-A.

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