Variable Frequency Microwave and Convection Furnace Curing of Polybenzoxazole Buffer Layer for GaAs HBT Technology von Yota, J., Ly, H., Ramanathan, R., Hsiang-Chih Sun, Barone, D., Nguyen, T., Katoh, K., Ohe, M., Hubbard, R.L., Hicks, K.

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Study on Adhesion Improvement of Polyimide Film von Katoh, Kohji, Motobe, Takeharu, Ohe, Masayuki, Soejima, Kazuya, Kaneya, Yuichi, Tanaka, Toshiaki, Itabashi, Toshiaki

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Latest Technology of Stress Buffer Material for Semiconductor Application von Katoh, Kohji

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High-Contrast Chemically Amplified Photodefinable Poly(benzoxazole) Using Dissolution Reversers von Minegishi, Tomonori, Takusari, Hisanori, Katoh, Kohji

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New Polyimides Coating Technology for Next Generation Semiconductor Application von Katoh, Kohji, Ohe, Masayuki, Komatsu, Hiroshi, Motobe, Takeharu, Hattori, Takashi, Ueno, Takumi

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Effects of dry-heated egg white on rheological properties and structure of Chinese type noodles von Tachi, K. (Marushin Flour Milling Co. Ltd., Kanie, Aichi (Japan)), Ogawa, N, Shimoyamada, M, Watanabe, K, Katoh, K

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Effects of dry-heated egg white on the rheological properties and structure of frozen Chinese noodles von Tachi, K. (Marushin Flour Milling Co. Ltd., Kanie, Aichi (Japan)), Ogawa, N, Shimoyamada, M, Watanabe, K, Katoh, K

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Structural Design of Resin Matrix and Acid-labile Dissolution Inhibitor of Chemical Amplification Positive Electron-beam Resist for Gigabit Lithography von Sakamizu, Toshio, Arai, Tadasi, Katoh, Kohji, Uchino, Shou-ichi, Murai, Fumio, Suzuki, Yasunori, Shiraishi, Hiroshi

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A sensitive positive resist for 0.1-.MU.m electron-beam direct-writing lithography von Arai, Tadashi, Sakamizu, Toshio, Katoh, Kohji, Hashimoto, Michiaki, Shiraishi, Hiroshi

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DEVELOPMENT OF POSITIVE ELECTRON-BEAM CHEMICAL AMPLIFICATION RESISTS USING TETRAHYDROPYRANYL-PROTECTED POLYVINYLPHENOL von Katoh, Kohji, Hashimoto, Michiaki, Sakamizu, Toshio, Shiraishi, Hiroshi, Ueno, Takumi

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Variable frequency microwave and convection furnace curing of polybenzoxazole buffer layer for GaAs JBT technology von YOTA, Jiro, LY, Hoa, RAMANATHAN, Ravi, SUN, Hsiang-Chih, BARONE, Dragana, NGUYEN, Thinh, KATOH, Kohji, OHE, Masayuki, HUBBARD, Robert L, HICKS, Keith

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A sensitive positive resist for 0.1-μm electron-beam direct-writing lithography von Arai, Tadashi, Sakamizu, Toshio, Katoh, Kohji, Hashimoto, Michiaki, Shiraishi, Hiroshi

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A sensitive positive resist for 0.1-[mu]m electron-beam direct-writing lithography von Arai, Tadashi, Sakamizu, Toshio, Katoh, Kohji, Hashimoto, Michiaki, Shiraishi, Hiroshi

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Fahrzeugparkassistenzsystem und Verfahren von Yanagawa, Hirohiko, Katoh, Kohji, Shimizu, Hiroaki

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Vehicle parking assisting system and method von TETSUYA OKI, KOHJI KATOH, HIROHIKO YANAGAWA

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Vehicle parking assisting system von KOHJI KATOH, HIROAKI SHIMIZU, MASAKAZU KAGAWA

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Vehicle parking assisting system and method von YANAGAWA HIROHIKO, KATOH KOHJI, OKI TETSUYA

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Vehicle parking assisting system and method von Oki, Tetsuya, Katoh, Kohji, Yanagawa, Hirohiko

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Vehicle parking assistant system and method von KATOH KOHJI,YANAGAWA HIROHIKO,SHIMIZU HIROAKI

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Vehicle parking assistance system, has control unit provided for fixing path of front end of vehicle into supposition and controlling display device, such that display device displ... von KATOH, KOHJI, YANAGAWA, HIROHIKO, SHIMIZU, HIROAKI

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