Dynamic behaviour of the reactive sputtering process von Kubart, T., Kappertz, O., Nyberg, T., Berg, S.

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Towards understanding the superior properties of transition metal oxynitrides prepared by reactive DC magnetron sputtering von Venkataraj, S., Severin, D., Mohamed, S.H., Ngaruiya, J., Kappertz, O., Wuttig, M.

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Correlation between structure, stress and deposition parameters in direct current sputtered zinc oxide films von Kappertz, O., Drese, R., Wuttig, M.

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The effect of target aging on the structure formation of zinc oxide during reactive sputtering von Severin, D., Kappertz, O., Nyberg, T., Berg, S., Wuttig, M.

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Effect of heat treatment on structural, optical and mechanical properties of sputtered TiOxNy films von MOHAMED, S. H, KAPPERTZ, O, NIEMEIER, T, DRESE, R, WAKKAD, M. M, WUTTIG, M

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Temperature stability of sputtered niobium–oxide films von Venkataraj, S., Drese, R., Liesch, Ch, Kappertz, O., Jayavel, R., Wuttig, M.

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Correlation between structure, stress and optical properties in direct current sputtered molybdenum oxide films von Mohamed, S.H, Kappertz, O, Ngaruiya, J.M, Leervad Pedersen, T.P, Drese, R, Wuttig, M

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Influence of nitrogen content on properties of direct current sputtered TiOxNy films von Mohamed, S. H., Kappertz, O., Ngaruiya, J. M., Niemeier, T., Drese, R., Detemple, R., Wakkad, M. M., Wuttig, M.

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Reactive sputter deposition of zinc oxide: Employing resputtering effects to tailor film properties von Kappertz, O., Drese, R., Ngaruiya, J.M., Wuttig, M.

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Structure formation upon reactive direct current magnetron sputtering of transition metal oxide films von Ngaruiya, J.M., Kappertz, O., Mohamed, S.H., Wuttig, M., I. Physikalisches Institut der RWTH Aachen, D-52056 Aachen

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Growth and characterization of zirconium oxynitride films prepared by reactive direct current magnetron sputtering von Venkataraj, S., Kappertz, O., Jayavel, R., Wuttig, M.

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Process stabilization and increase of the deposition rate in reactive sputtering of metal oxides and oxynitrides von Severin, D., Kappertz, O., Kubart, T., Nyberg, T., Berg, S., Pflug, A., Siemers, M., Wuttig, M.

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Preparation and characterization of tantalum oxide films produced by reactive DC magnetron sputtering von Ngaruiya, J. M., Venkataraj, S., Drese, R., Kappertz, O., Leervad Pedersen, T. P., Wuttig, M.

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Water and oil repellent coating on fabric using hollow cathode PECVD von Mbamkeu Chakounté, R.G., Jolibois, J., Kappertz, O., Chambers, J., Weis, H., Wiame, H., Viöl, W.

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Thermal stability of sputtered zirconium oxide films von Venkataraj, S., Kappertz, O., Liesch, Ch, Detemple, R., Jayavel, R., Wuttig, M.

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Characterization of Niobium Oxide Films Prepared by Reactive DC Magnetron Sputtering von Venkataraj, S., Drese, R., Kappertz, O., Jayavel, R., Wuttig, M.

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Properties of TiOx coatings prepared by dc magnetron sputtering von Mohamed, S. H., Kappertz, O., Leervad Pedersen, T. P., Drese, R., Wuttig, M.

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Comparing XPS and ToF-ERDA measurement of high-k dielectric materials von Martin, D M, Enlund, J, Kappertz, O, Jensen, J

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Composition and formation mechanism of zirconium oxynitride films produced by reactive direct current magnetron sputtering von Ngaruiya, J. M., Kappertz, O., Liesch, C., Müller, P., Dronskowski, R., Wuttig, M.

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Structural and optical properties of thin zirconium oxide films prepared by reactive direct current magnetron sputtering von Venkataraj, S., Kappertz, Oliver, Weis, Hansjörg, Drese, Robert, Jayavel, R., Wuttig, Matthias

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