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  1. 1
    Characterization of the newly isolated ω-oxidizing yeast Candida sorbophila DS02 and its potential applications in long-chain dicarboxylic acid production

    Characterization of the newly isolated ω-oxidizing yeast Candida sorbophila DS02 and its potential applications in long-chain dicarboxylic acid production von Lee, Heeseok, Sugiharto, Yohanes Eko Chandra, Lee, Seunghoon, Park, Gyuyeon, Han, Changpyo, Jang, Hyeran, Jeon, Wooyoung, Park, Heejoon, Ahn, Jungoh, Kang, Kyungbo, Lee, Hongwoen


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  2. 2
    Characterization of the newly isolated [omega]-oxidizing yeast Candida sorbophila DS02 and its potential applications in long-chain dicarboxylic acid production

    Characterization of the newly isolated [omega]-oxidizing yeast Candida sorbophila DS02 and its potential applications in long-chain dicarboxylic acid production von Lee, Heeseok, Sugiharto, Yohanes Eko Chandra, Lee, Seunghoon, Park, Gyuyeon, Han, Changpyo, Jang, Hyeran, Jeon, Wooyoung


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  3. 3
    SUBSTRATE POLISHING APPARTUS AND METHOD OF POLISHING SUBSTRATE

    SUBSTRATE POLISHING APPARTUS AND METHOD OF POLISHING SUBSTRATE von KANG SEUNG BAE, KANG SEUNGIK, KIM PUNGSEOK, NAM JUNG GUN, LEE KYUNGBO, YANG HEE SUNG, CHOO BYOUNG KWON, CHO WOO JIN

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  4. 4
    SUBSTRATE TREATING APPARATUS AND METHOD OF REPLACING THE POLISHING PAD OF SUBSTRATE TREATING APPARATUS

    SUBSTRATE TREATING APPARATUS AND METHOD OF REPLACING THE POLISHING PAD OF SUBSTRATE TREATING APPARATUS von KANG SEUNG BAE, PARK SUNGHYEON, KANG BONG GU, LEE KYUNGBO, YANG HEE SUNG, CHOO BYOUNG KWON, CHO WOO JIN, LEE KEUNWOO

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  5. 5
    POLISHING HEAD UNIT SUBSTRATE PROCESING APPARATUS INCLUDING THE SAME AND PROCESSING METHOD OF SUBSTRATE USING THE SAME

    POLISHING HEAD UNIT SUBSTRATE PROCESING APPARATUS INCLUDING THE SAME AND PROCESSING METHOD OF SUBSTRATE USING THE SAME von KANG SEUNG BAE, PARK SUNGHYEON, NAM JUNG GUN, LEE KYUNGBO, CHOO BYOUNG KWON, CHO WOO JIN, BAE JOON HWA, LEE KEUNWOO

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