Precision improvement in optical proximity correction by optimizing second illumination source shape von NAKAE, A, KAMON, K, HANAWA, T, MORIIZUMI, K, NAKAO, S

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Photolithography system using annular illumination von KAMON, K, MIYAMOTO, T, MYOI, Y, NAGATA, H, TANAKA, M, HORIE, K

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Fabrication of 0.1 µm Patterns Using an Alternating Phase Shift Mask in ArF Excimer Laser Lithography von Keisuke Nakazawa, Keisuke Nakazawa, Masaya Uematsu, Masaya Uematsu, Toshio Onodera, Toshio Onodera, Kazuya Kamon, Kazuya Kamon, Tohru Ogawa, Tohru Ogawa, Shigeyasu Mori, Shigeyasu Mori, Makoto Takahashi, Makoto Takahashi, Takeshi Ohfuji, Takeshi Ohfuji, Hiroshi Ohtsuka, Hiroshi Ohtsuka, Masaru Sasago, Masaru Sasago

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Semiconductor device comprising an antiferroelectric gate insulating film von KAMON KAZUYA

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Theoretical Calculations of Sensitivity of Deprotection Reactions for Acrylic Polymers for 193 nm Lithography II: Protection Groups Containing an Adamantyl Unit von Matsuzawa, Nobuyuki N., Takechi, Satoshi, Ohfuji, Takeshi, Kuhara, Koichi, Mori, Shigeyasu, Endo, Masayuki, Kamon, Kazuya, Morisawa, Taku, Yamaguchi, Atsuko, Sasago, Masaru

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Photolithography System Using a Combination of Modified Illumination and Phase Shift Mask von Kamon, Kazuya, Miyamoto, Teruo, Myoi, Yasuhito, Nagata, Hitoshi, Tanaka, Norihiko Kotani

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Photolithography system using modified illumination von KAMON, K, MIYAMOTO, T, MYOI, Y, NAGATA, H, TANAKA, M

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Semiconductor integrated circuit and pattern layouting method for the same von KAMON KAZUYA

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SEMICONDUCTOR INTEGRATED CIRCUIT AND PATTERN LAYOUT METHOD THEREOF von KAMON KAZUYA

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MASK DESIGN DEVICE AND MASK DESIGN METHOD von KAMON KAZUYA

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SEMICONDUCTOR INTEGRATED CIRCUIT AND PATTERN LAYOUTING METHOD FOR THE SAME von KAMON KAZUYA

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Semiconductor integrated circuit and pattern layouting method for the same von KAMON KAZUYA

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Proposal of a next-generation super resolution technique von KAMON, K, MIYAMOTO, T, MYOI, Y, WAKAMIYA, W, NAGATA, H, TANAKA, M

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SEMICONDUCTOR DEVICE von KAMON KAZUYA

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SEMICONDUCTOR DEVICE von KAMON KAZUYA

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Effect of lens aberration on resist pattern profiles in edge-line phase-shift method von NAKATANI, M, KOJIMA, Y, NAKANO, H, KAMON, K, SATO, K, TAKANO, H, ISHIHARA, O

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SEMICONDUCTOR INTEGRATED CIRCUIT AND PATTERN LAYOUT METHOD THEREOF von KAMON KAZUYA

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SEMICONDUCTOR INTEGRATED CIRCUIT AND PATTERN LAYOUTING METHOD FOR THE SAME von KAMON KAZUYA

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UPSAMPLING DEVICE AND DOWNSAMPLING DEVICE von KAMON KAZUYA

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METHOD OF MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE von KAMON KAZUYA

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