Inhibition of carbon growth and removal of carbon deposits on extreme ultraviolet lithography mirrors by extreme ultraviolet irradiation in the presence of water, oxygen, or oxygen... von Niibe, Masahito, Koida, Keigo, Kakutani, Yukinobu

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In situ x-ray absorption near-edge structure analysis for extreme ultraviolet lithography projection optics contamination von Niibe, Masahito, Kakutani, Yukinobu, Koida, Keigo, Matsunari, Shuichi, Aoki, Takashi, Terashima, Shigeru, Takase, Hiromitsu, Murakami, Katsuhiko, Fukuda, Yasuaki

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Nonlinear Behavior of Decrease in Reflectivity of Multilayer Mirrors for Extreme Ultraviolet Lithography Optics by High-Flux Extreme Ultraviolet Irradiation in Various Vacuum Envir... von Niibe, Masahito, Koida, Keigo, Kakutani, Yukinobu, Nakayama, Takahiro, Terashima, Shigeru, Miyake, Akira, Kubo, Hiroyoshi, Matsunari, Shuichi, Aoki, Takashi, Kawata, Shintaro

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Monte-Carlo simulation on Compton double scattering of polarized X-rays von Kakutani, Yukinobu, Sakai, Nobuhiko

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Contamination Evaluation System for Extreme Ultraviolet Mirrors with the Use of Undulator Radiation von Niibe, Masahito, Kakutani, Yukinobu, Kakiuchi, Kazuya, Terashima, Shigeru, Takase, Hiromitu, Gomei, Yoshio, Aoki, Takashi, Matsunari, Shuichi, Kondo, Hiroyuki, Fukuda, Yasuaki

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Study of the e{sub g} Orbitals in the Bilayer Manganite La{sub 2{minus}2x}Sr{sub 1+2x}Mn{sub 2}O{sub 7} by Using Magnetic Compton-Profile Measurement von Koizumi, Akihisa, Miyaki, Satoru, Kakutani, Yukinobu, Koizumi, Hiroyasu, Hiraoka, Nozomu, Makoshi, Kenji, Sakai, Nobuhiko, Hirota, Kazuma, Murakami, Yoichi

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CLEANING METHOD, EXPOSURE DEVICE, DEVICE MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM von KAKUTANI YUKINOBU, NAKANO KATSUSHI, WATANABE SHUNJI

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A new EUV irradiation and multilayer evaluation system for EUVL mirror contamination in NewSUBARU von Niibe, M., Kakutani, Y., Terashima, S., Takase, H., Gomei, Y., Mtsunari, S., Aoki, T., Murakami, K., Fukuda, Y.

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Suppression of reflectance drop of Ru-capped multilayer mirror by irradiation atmosphere von Kakutani, Y., Niibe, M., Takase, H., Terashima, S., Gomei, Y., Matsunari, S., Aoki, T., Murakami, K., Fukuda, Y.

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Experiment of EUV mirror contamination with use of undulator radiation von Niibe, M., Kakutani, Y., Kakiuchi, K., Terashima, S., Takase, H., Gomei, Y., Aoki, T., Mtsunari, S., Kondo, H., Fukuda, Y.

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