300-mW narrow-linewidth deep-ultraviolet light generation at 193 nm by frequency mixing between Yb-hybrid and Er-fiber lasers von Xuan, Hongwen, Zhao, Zhigang, Igarashi, Hironori, Ito, Shinji, Kakizaki, Kouji, Kobayashi, Yohei

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Microstructure Formation on Glass Substrates for High-productivity Fabrication of Micro-vias Using 248 nm Excimer Laser von Kawasuji, Yasufumi, Adachi, Yasuhiro, Moro, Kazuhiko, Kakizaki, Kouji, Washio, Masakazu

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Single frequency, 5 ns, 200 μJ, 1553 nm fiber laser using silica based Er-doped fiber von Zhao, Zhigang, Xuan, Hongwen, Igarashi, Hironori, Ito, Shinji, Kakizaki, Kouji, Kobayashi, Yohei

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Enhancement of Glass Ablation Rate During Micro-via Processing using Very Long Pulse 248-nm Excimer Laser for Semiconductor Interposer Packaging von Kawasuji, Yasufumi, Suwa, Akira, Adachi, Yasuhiro, Tanaka, Tomonari, Kakizaki, Kouji, Washio, Masakazu

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Laser device and electronic device manufacturing method von Sasaki, Yoichi, Mizoguchi, Hakaru, Kakizaki, Kouji

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LASER MACHINING SYSTEM AND LASER MACHINING METHOD von KAKIZAKI, Kouji, WAKABAYASHI, Osamu

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Laser processing system and laser processing method von Kakizaki, Kouji, Wakabayashi, Osamu

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Design concept and performance considerations for fast high power semiconductor switching for high repetition rate and high power excimer laser von Goto, Tatsumi, Kakizaki, Kouji, Takagi, Shigeyuki, Satoh, Saburoh, Shinohe, Takashi, Ohashi, Hiromichi, Endo, Fumihiko, Okamura, Katsuya, Ishii, Akira, Teranishi, Tsuneharu, Yasuoka, Koichi

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LASER MACHINING SYSTEM AND LASER MACHINING METHOD von KAKIZAKI, Kouji, WAKABAYASHI, Osamu

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LASER DEVICE AND LASER PROCESSING SYSTEM von KAKIZAKI, Kouji, WAKABAYASHI, Osamu

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LASER DEVICE AND LASER PROCESSING SYSTEM von KAKIZAKI, Kouji, WAKABAYASHI, Osamu

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LASER MACHINING SYSTEM AND LASER MACHINING METHOD von KAKIZAKI, Kouji, WAKABAYASHI, Osamu

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LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD von KAKIZAKI, Kouji, SASAKI, Yoichi, MIZOGUCHI, Hakaru

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LASER APPARATUS AND LASER PROCESSING SYSTEM von KAKIZAKI, Kouji, WAKABAYASHI, Osamu

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Development of 193-nm narrow-linewidth solid state laser system using CLBO crystal for ArF excimer laser seeding von Igarashi, Hironori, Xuan, Hongwen, Zhao, Zhigang, Ito, Shinji, Kakizaki, Kouji, Kobayashi, Yohei

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Laser system or laser exposure system von Fujimoto, Junichi, Wakabayashi, Osamu, Kakizaki, Kouji

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GAS LASER DEVICE, METHOD FOR CONTROLLING TEMPERATURE OF LASER GAS, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE von HATTORI, Masakazu, KAKIZAKI, Kouji, KUMAZAKI, Takahito

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Development of "Shot level beam performance monitoring system" technology for ArF eximer lasers for semiconductor lithography tools von Watabe, Yoshinobu, Moriya, Masato, Kumazaki, Takahito, Tsushima, Hiroaki, Kurosu, Akihiko, Ohta, Takeshi, Kakizaki, Kouji, Matsunaga, Takashi, Mizoguchi, Hakaru

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Excimer laser apparatus and excimer laser system von Wakabayashi, Osamu, Kakizaki, Kouji, Asayama, Takeshi

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Development of “Life extention of chamber”technology for ArF eximer lasers for semiconductor lithography tools von Suwa, Akira, Ikeda, Hiroyuki, Katsuumi, Hisakazu, Asayama, Takeshi, Tsushima, Hiroaki, Kumazaki, Takahito, Kurosu, Akihiko, Ohta, Takeshi, Kakizaki, Kouji, Matsunaga, Takashi, Mizoguchi, Hakaru

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