Oxidation characteristics of silicon exposed to O(1D2) and O(3P2) radicals and stress-relaxation oxidation model for O(1D2) radicals von Kabe, Yoshiro, Hasunuma, Ryu, Yamabe, Kikuo

Volltext

Oxidation of Silicon Utilizing a Microwave Plasma System: Electric-Stress Hardening of SiO2 Films by Controlling the Surface and Interface Roughness von Kabe, Yoshiro, Hasunuma, Ryu, Yamabe, Kikuo

Volltext

The Temperature Coefficients of Frequency of Surface Acoustic Wave Devices With SiOxNy Passivation Films on LiTaO3 Substrates von Nishimura, Atsushi, Matsuda, Satoru, Kabe, Yoshiro

Volltext

The Temperature Coefficients of Frequency of Surface Acoustic Wave Devices With SiO x N y Passivation Films on LiTaO 3 Substrates von Nishimura, Atsushi, Matsuda, Satoru, Kabe, Yoshiro

Volltext

The Temperature Coefficients of Frequency of Surface Acoustic Wave Devices With SiO x N y Passivation Films on LiTaO3 Substrates von Nishimura, Atsushi, Matsuda, Satoru, Kabe, Yoshiro

Volltext

Frequency response study of surface acoustic wave devices with SiOxNy film using LiTaO3 substrate von Nishimura, Atsushi, Matsuda, Satoru, Kabe, Yoshiro, Nakamura, Hiroyuki

Volltext

Frequency response study of surface acoustic wave devices with SiO x N y film using LiTaO 3 substrate von Nishimura, Atsushi, Matsuda, Satoru, Kabe, Yoshiro, Nakamura, Hiroyuki

Volltext

Frequency response study of surface acoustic wave devices with SiO ^sub x^ N ^sub y^ film using LiTaO^sub 3^ substrate von Nishimura, Atsushi, Matsuda, Satoru, Kabe, Yoshiro, Nakamura, Hiroyuki

Volltext

Oxidation of Silicon Utilizing a Microwave Plasma System: Electric-Stress Hardening of SiO 2 Films by Controlling the Surface and Interface Roughness von Kabe, Yoshiro, Hasunuma, Ryu, Yamabe, Kikuo

Volltext

Oxidation characteristics of silicon exposed to O( super(1)D sub(2)) and O( super(3)P sub(2)) radicals and stress-relaxation oxidation model for O( super(1)D sub(2)) radicals von Kabe, Yoshiro, Hasunuma, Ryu, Yamabe, Kikuo

Volltext

1J3-1 Study for Frequency Response of SAW Devices with SiOxNy Film Using LiTaO3 Substrate von Nishimura, Atsushi, Matsuda, Satoru, Kabe, Yoshiro, Nakamura, Hiroyuki

Volltext

Oxidation of Silicon Utilizing a Microwave Plasma System: Electric-Stress Hardening of SiO 2 Films by Controlling the Surface and Interface Roughness von Kabe, Yoshiro, Hasunuma, Ryu, Yamabe, Kikuo

Volltext

Evaluation of Properties of SiO 2 Films Fabricated by Plasma Oxidation von Yamaguchi, Takuya, Nagata, Kohki, Ogura, Atsushi, Koganezawa, Tomoyuki, Hirosawa, Ichiro, Kabe, Yoshiro, Sato, Yoshihiro, Ishizuka, Shuuichi, Hirota, Yoshihiro

Volltext

Acoustic wave device including interdigital electrodes covered by silicon oxynitride film von Nishimura, Atsushi, Matsuda, Satoru, Kabe, Yoshiro

Volltext bestellen

Long TDDB Lifetime of SiO 2 Film by Controlling Degradation Rate and SiO 2 /Si Micro-roughness von Kabe, Yoshiro, Kitagawa, Junichi, Hirota, Yoshihiro, Sato, Shinkuro, Sometani, Mitsuru, Hasunuma, Ryu, Yamabe, Kikuo

Volltext

METHODS OF MANUFACTURING ACOUSTIC WAVE DEVICE WITH ANTI-REFLECTION LAYER von Nagano, Kenji, Matsuda, Satoru, Kabe, Yoshiro, Fujii, Tatsuya

Volltext bestellen

Methods of manufacturing acoustic wave device with anti-reflection layer von Nagano, Kenji, Matsuda, Satoru, Kabe, Yoshiro, Fujii, Tatsuya

Volltext bestellen

Acoustic wave device with anti-reflection layer von Nagano, Kenji, Matsuda, Satoru, Kabe, Yoshiro, Fujii, Tatsuya

Volltext bestellen

METHODS OF MANUFACTURING ACOUSTIC WAVE DEVICE WITH ANTI-REFLECTION LAYER von Nagano, Kenji, Matsuda, Satoru, Kabe, Yoshiro, Fujii, Tatsuya

Volltext bestellen

ACOUSTIC WAVE DEVICE WITH ANTI-REFLECTION LAYER von Nagano, Kenji, Matsuda, Satoru, Kabe, Yoshiro, Fujii, Tatsuya

Volltext bestellen