Design and performance of mass-produced sideband separating SIS mixers for ALMA band 4 receivers von Kojima, Takafumi, Kuroiwa, Koichi, Takahashi, Toshikazu, Fujii, Yumi, Uzawa, Yoshinori, Asayama, Shin'ichiro, Noguchi, Takashi

Volltext

Interaction of PbTiO3 films with Si substrate von SHICHI, Y, TANIMOTO, S, GOTO, T, KUROIWA, K, TARUI, Y

Volltext

Short-slot Hybrid Coupler Using Linear Taper in W-band von Kuroiwa, Koichi, Gonzalez, Alvaro, Koyano, Makoto, Kojima, Takafumi, Fujii, Yasunori, Uzawa, Yoshinori, Ogawa, Hideo

Volltext

Deposition of low hydrogen content silicon nitride film using high-intensity vacuum ultraviolet light source in windowless photochemical vapor deposition reactor von UENO, T, NAGAYOSHI, H, MORINAKA, H, KUROIWA, K, TARUI, Y

Volltext

The First Six ALMA Band 10 Receivers von Fujii, Y., Gonzalez, A., Kroug, M., Kaneko, K., Miyachi, A., Yokoshima, T., Kuroiwa, K., Ogawa, H., Makise, K., Zhen Wang, Uzawa, Y.

Volltext

Fabrication of c-Axis Oriented Pb(Zr, Ti)O 3 Thin Films on Si(100) Substrates Using MgO Intermediate Layer von Senzaki, Junji, Mitsunaga, Osamu, Uchida, Takahito, Tomo Ueno, Tomo Ueno, Koichi Kuroiwa, Koichi Kuroiwa

Volltext

A Horn-to-Horn Power Transmission System at Terahertz Frequencies von Gonzalez, A., Uzawa, Y., Fujii, Y., Kaneko, K., Kuroiwa, K.

Volltext

HfO 2 /Si and HfSiO/Si Structures Fabricated by Oxidation of Metal Thin Films von Oniki, Yusuke, Iwazaki, Yoshitaka, Hasumi, Masahiko, Ueno, Tomo, Kuroiwa, Koichi

Volltext

Contributions of Silicon-Hydride Radicals to Hydrogenated Amorphous Silicon Film Formation in Windowless Photochemical Vapor Deposition System von Sawado, Yoshinori, Akiyama, Takeshi, Ueno, Tomo, Kamisako, Koichi, Koichi Kuroiwa, Koichi Kuroiwa, Yasuo Tarui, Yasuo Tarui

Volltext

Tantalum oxide films formed by UV photo-CVD using ozone and TaCl5 von TANIMOTO, S, MATSUI, M, AOYAGI, M, KAMISAKO, K, KUROIWA, K, TARUI, Y

Volltext

Synchronously Excited Discrete Chemical Vapor Deposition of Ta2 O 5 von Tanimoto, Satoshi, Shibata, Nami, Kuroiwa, Koichi, Tarui, Yasuo

Volltext

Thermal properties of various Ta precursors used in chemical vapor deposition of tantalum pentoxide von KOYAMA, H, TANIMOTO, S, KUROIWA, K, TARUI, Y

Volltext

Fabrication of c-axis oriented Pb(Zr, Ti)O3 thin films on Si(100) substrates using MgO intermediate layer von SENZAKI, J, MITSUNAGA, O, UCHIDA, T, UENO, T, KUROIWA, K

Volltext

Thermal Stability of HfO 2 Films Fabricated by Metal Organic Chemical Vapor Deposition von Nagasato, Yoshitaka, Iwazaki, Yoshitaka, Hasumi, Masahiko, Ueno, Tomo, Kuroiwa, Koichi

Volltext

Amorphous silicon thin-film transistors employing photoprocessed tantalum oxide films as gate insulators von MATSUI, M, NAGAYOSHI, H, MUTO, G, TANIMOTO, S, KUROIWA, K, TARUI, Y

Volltext

High-Intensity Vacuum Ultraviolet Light Source in Windowless Photochemical Vapor Deposition Reactor and Its Application to a-Si:H Deposition von Kuroiwa, Koichi, Yamazaki, Hiroshi, Tsuchiya, Satoshi, Koichi Kamisako, Koichi Kamisako, Yasuo Tarui, Yasuo Tarui

Volltext

Low pressure metalorganic vapor phase epitaxy of InP in a vertical reactor von OISHI, M, KUROIWA, K

Volltext

Fabrication of High-k/Si Structure Using Metal Deposition Followed by Oxidation von Oniki, Yusuke, Iwazaki, Yoshitaka, Hasumi, Masahiko, Ueno, Tomo, Kuroiwa, Koichi

Volltext

Tantalum Oxide Films Formed by UV Photo-CVD Using Ozone and TaCl 5 von Tanimoto, Satoshi, Matsui, Masahiro, Aoyagi, Minoru, Kamisako, Koichi, Koichi Kuroiwa, Koichi Kuroiwa, Yasuo Tarui, Yasuo Tarui

Volltext

Photo-process of tantalum oxide films and their characteristics von MATSUI, M, OKA, S, YAMAGISHI, K, KUROIWA, K, TARUI, Y

Volltext