Novel compensation chemical metal polishing for low dishing and high global planarity for ultra-planar die applications in micro-optics and micro-electro-mechanical systems von Ganguly, Udayan, Peter Krusius, J.

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Fabrication of ultraplanar aluminum mirror array by novel encapsulation CMP for microoptics and MEMS applications von GANGULY, Udayan, KRUSIUS, J. Peter

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Laser-induced lateral epitaxy in fully depleted silicon-on-insulator junctions von Dezfulian, Kevin K., Krusius, J. Peter, Thompson, Michael O., Talwar, Somit

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CMOS shallow-trench-isolation to 50-nm channel widths von VanDerVoom, P., Gan, D., Krusius, J.P.

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Approaches toward ultralarge FPDs von Krusius, J.P., Seraphim, D.P., Greene, R.G., Skinner, D.S., Yost, B.

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Approaches toward ultralarge FPDs: Flat-panel display technology von KRUSIUS, J. Peter, SERAPHIM, Donald P, GREENE, Raymond G, SKINNER, Dean S, YOST, Boris

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Packaging alternatives to large silicon chips: tiled silicon on MCM and PWB substrates von George, A.G., Krusius, J.P., Granitz, R.F.

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Transient thermal response due to periodic heating on a convectively cooled substrate von Fisher, T.S., Avedisian, C.T., Krusius, J.P.

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Modeling and simulation of integrated capacitors for high frequency chip power decoupling von Diaz-Alvarez, E., Krusius, J.P., Kroeger, F.

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Physical design alternatives for RISC workstation packaging von O'Brien, D.E., Hahne, B.M., Krusius, J.P.

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Series resistance of silicided ohmic contacts for nanoelectronics von Chieh, Y.-S., Perera, A.K., Krusius, J.P.

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Heterojunction vertical FETs revisited: potential for 225-GHz large-current operation von Weinzierl, S.R., Krusius, J.P.

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Characteristics of submicrometer gaps in buried-channel CCD structures von Hoople, C.R., Krusius, J.P.

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Electrical limitations of advanced LOCOS isolation for deep submicrometer CMOS von Lutze, J.W., Krusius, J.P.

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Associate editors, guest editors, and reviewers

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Electronic Components and Technology Conference (ECTC) von KRUSIUS, J. Peter

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Correction to "1997 list of reviewers" von Krusius, J. Peter

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Editor's statement von Krusius, J. Peter

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Spin-on-glass for 200 nm trench isolation structures von Lutze, J W, Shacham-Diamand, Y Y, Krusius, J P

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A new positive novalac-based resist for sub-micron ebeam lithography von Perera, Asanga H., Krusius, J.Peter

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