The structure and electrochemical behavior of nitrogen-containing nanocrystalline diamond films deposited from CH4/N2/Ar mixtures von QINGYUN CHEN, GRUEN, Dieter M, KRAUSS, Alan R, CORRIGAN, Timothy D, WITEK, Malgorzata, SWAIN, Greg M

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Temperature dependence of the growth rate for nanocrystalline diamond films deposited from an Ar/CH4 microwave plasma von McCauley, Thomas G., Gruen, Dieter M., Krauss, Alan R.

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Fullerenes as precursors for diamond film growth without hydrogen or oxygen additions von Gruen, Dieter M., Liu, Shengzhong, Krauss, Alan R., Luo, Jianshu, Pan, Xianzheng

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Buckyball microwave plasmas: Fragmentation and diamond-film growth von Gruen, Dieter M., Liu, Shengzhong, Krauss, Alan R., Pan, Xianzheng

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In   situ laser reflectance interferometry measurement of diamond film growth von Zuiker, Christopher D., Gruen, Dieter M., Krauss, Alan R.

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The Structure and Electrochemical Behavior of Nitrogen-Containing Nanocrystalline Diamond Films Deposited from CH[sub 4]/N[sub 2]/Ar Mixtures von Chen, Qingyun, Gruen, Dieter M., Krauss, Alan R., Corrigan, Timothy D., Witek, Malgorzata, Swain, Greg M.

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X-ray Photoemission and Energy Dispersive Spectroscopy of Hydroxyapatite-Coated Titanium von Drummond, James L., Steinberg, Arnold D., Krauss, Alan R.

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Initial oxidation of zirconium and Zircaloy-2 with oxygen and water vapor at room temperature von Yoshitaka Nishino, Krauss, Alan R., Yuping Lin, Gruen, Dieter M.

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(Ba{sub x}Sr{sub 1-x})Ti{sub 1+y}O{sub 3+z} interface contamination and its effect on electrical properties von Im, Jaemo, Streiffer, S. K., Auciello, Orlando, Krauss, Alan R.

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( Ba x Sr 1−x ) Ti 1+y O 3+z interface contamination and its effect on electrical properties von Im, Jaemo, Streiffer, S. K., Auciello, Orlando, Krauss, Alan R.

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Studies of multicomponent oxide films and layered heterostructure growth processes via in situ, time-of-flight ion scattering and direct recoil spectroscopy von Auciello, Orlando, Krauss, Alan R, Im, Jaemo, Schultz, J Albert

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In situ analysis of thin film deposition process using time of flight (TOF) ion beam analysis methods von Im, Jaemo, Krauss, Alan R., Lin, Yuping, Schultz, J.A., Auciello, Orlando H., Gruen, Dieter M., Chang, R.P.H.

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Atmosphere influence on in-situ ion beam analysis of thin film growth von YUPING LIN, KRAUSS, A. R, CHANG, R. P. H, AUCIELLO, O. H, GRUEN, D. M, SCHULTZ, J. A

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In Situ Real-Time Characterization of Thin Films von Krauss, Orlando Auciello and Alan R

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Studies of ferroelectric heterostructure thin films and interfaces, via in situ analytical techniques von Auciello, Orlando, Krauss, Alan R., Im, Jaemo, Dhote, Anil, Gruen, Dieter M., Irene, Eugene A., Gao, Ying, Mueller, Alex H., Ramesh, Ramamoorthy

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Studies of ferroelectric heterostructure thin films, interfaces, and device-related processes via in situ analytical techniques von Auciello, Orlando, Krauss, Alan R., Im, Jaemo, Dhote, Anil, Gruen, Dieter M., Aggarwal, Sanjeev, Ramesh, Ramamoorthy, Irene, Eugene A., Gao, Ying, Mueller, Alex H.

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Filtered cathodic arc deposition apparatus and method von KRAUSS, ALAN R

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Self-sustaining thin films as a means of reducing first wall erosion and plasma impurity influx von Krauss, Alan R., Gruen, Dieter M.

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Determination of ion fraction and energy analysis of sputtered particles from deuterium bombarded surfaces von Krauss, Alan R., Gruen, Dieter M.

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Method of improving field emission characteristics of diamond thin films von GRUEN, DIETER M, KRAUSS, ALAN R

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