Characterization of double gate TFTs fabricated in advanced SLS ELA polycrystalline silicon films von Kouvatsos, Dimitrios N., Farmakis, Filippos V., Moschou, Despina C., Kontogiannopoulos, Giannis P., Papaioannou, George J., Voutsas, Apostolos T.

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Hot-carrier stress induced degradation of SLS ELA polysilicon TFTs – Effects of gate width variation and device orientation von Kontogiannopoulos, Giannis P., Farmakis, Filippos V., Kouvatsos, Dimitrios N., Papaioannou, George J., Voutsas, Apostolos T.

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A Practical Model Assessing the Degradation of Polycrystalline Silicon TFTs Due to DC Electrical Stress von Kontogiannopoulos, Giannis P., Farmakis, Filippos V., Kouvatsos, Dimitrios N., Papaioannou, George J., Voutsas, Apostolos T.

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On the importance of the Vg,max―Vth parameter on LTPS TFT stressing behavior von MOSCHOU, Despina C, KONTOGIANNOPOULOS, Giannis P, KOUVATSOS, Dimitrios N, VOUTSAS, Apostolos T

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The effect of crystallization technology and gate insulator deposition method on the performance and reliability of polysilicon TFTs von Moschou, Despina C., Kontogiannopoulos, Giannis P., Kouvatsos, Dimitrios N., Voutsas, Apostolos T.

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On the importance of the V g,max– V th parameter on LTPS TFT stressing behavior von Moschou, Despina C., Kontogiannopoulos, Giannis P., Kouvatsos, Dimitrios N., Voutsas, Apostolos T.

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Front and Back Channel Properties of Asymmetrical Double-Gate Polysilicon TFTs von Farmakis, Filippos V., Kouvatsos, Dimitrios N., Voutsas, Apostolos T., Moschou, Despoina C., Kontogiannopoulos, Giannis P., Papaioannou, George J.

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