Angled etching of Si by ClF3-Ar gas cluster injection von Seki, Toshio, Yamamoto, Hiroki, Kozawa, Takahiro, Shojo, Tadashi, Koike, Kunihiko, Aoki, Takaaki, Matsuo, Jiro

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High-aspect-ratio patterning by ClF3-Ar neutral cluster etching von Yamamoto, Hiroki, Seki, Toshio, Matsuo, Jiro, Koike, Kunihiko, Kozawa, Takahiro

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Effect of Temperature on Degradation of Polymers for Photoresist Using Ozone Microbubbles von Matsuura, Kohei, Nishiyama, Takashi, Sato, Eriko, Yamamoto, Masashi, Kamimura, Tomosumi, Takahashi, Masayoshi, Koike, Kunihiko, Horibe, Hideo

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Degradation of Polymers for Resist Using Microbubbles on Ozonized Water von Matsuura, Kohei, Nishiyama, Takashi, Sato, Eriko, Yamamoto, Masashi, Takahashi, Masayoshi, Koike, Kunihiko, Horibe, Hideo

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Reaction mechanism of polymer removal using wet ozone von Goto, Yousuke, Angata, Yukihiro, Tsukazaki, Emi, Takahashi, Seiji, Koike, Kunihiko, Yamagishi, Tadaaki, Horibe, Hideo

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Anisotropic Etching Using Reactive Cluster Beams von Koike, Kunihiko, Yoshino, Yu, Senoo, Takehiko, Seki, Toshio, Ninomiya, Satoshi, Aoki, Takaaki, Matsuo, Jiro

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High aspect (>20) etching with reactive gas cluster injection von Seki, Toshio, Yamamoto, Hiroki, Koike, Kunihiko, Aoki, Takaaki, Matsuo, Jiro

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Gas-Solid Reaction Properties of Fluorine Compounds and Solid Adsorbents for Off-Gas Treatment from Semiconductor Facility von Yasui, Shinji, Shojo, Tadashi, Inoue, Goichi, Koike, Kunihiko, Takeuchi, Akihiro, Iwasa, Yoshio

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Removal of Ion-implanted Resists using High Concentration Wet Ozone von Goto, Yousuke, Angata, Yukihiro, Kono, Akihiko, Makihara, Naohisa, Koike, Kunihiko, Horibe, Hideo

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Synthesis of silicon dioxide film using high-concentration ozone and evaluation of the film quality von KOIKE, Kunihiko, IZUMI, Koichi, NAKAMURA, Sadaki, INOUE, Goichi, KUROKAWA, Akira, ICHIMURA, Shingo

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Highly Concentrated Ozone Gas for Preparing Wettable Polyimide Surface von Koike, Kunihiko, Aida, Toshihiro, Habuka, Hitoshi

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High-aspect-ratio patterning by ClF sub(3)-Ar neutral cluster etching von Yamamoto, Hiroki, Seki, Toshio, Matsuo, Jiro, Koike, Kunihiko, Kozawa, Takahiro

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Safety and Influence of Molecular Hydrogen/Carbon Dioxide Contained Drinking Water on Common Anthropometric and Laboratory Parameters von IKEDA, Yasuhiro, MUROYA, Satomi, SATOU, Kazutaka, INOUE, Goichi, KOIKE, Kunihiko, MAEKAWA, Tsuyoshi

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High-concentration ozone generator for oxidation of silicon operating at atmospheric pressure von Koike, Kunihiko, Fukuda, Tatsuo, Ichimura, Shingo, Kurokawa, Akira

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Reactive etching by ClF3-Ar neutral cluster beam with scanning von Seki, Toshio, Yoshino, Yu, Senoo, Takehiko, Koike, Kunihiko, Aoki, Takaaki, Matsuo, Jiro

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Angled etching of Si by ClF 3 –Ar gas cluster injection von Seki, Toshio, Yamamoto, Hiroki, Kozawa, Takahiro, Shojo, Tadashi, Koike, Kunihiko, Aoki, Takaaki, Matsuo, Jiro

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Angled etching of Si by ClF^sub 3^–Ar gas cluster injection von Seki, Toshio, Yamamoto, Hiroki, Kozawa, Takahiro, Shojo, Tadashi, Koike, Kunihiko, Aoki, Takaaki, Matsuo, Jiro

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Reactive etching by ClF 3 –Ar neutral cluster beam with scanning von Seki, Toshio, Yoshino, Yu, Senoo, Takehiko, Koike, Kunihiko, Aoki, Takaaki, Matsuo, Jiro

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Reactive etching by ClF sub(3)-Ar neutral cluster beam with scanning von Seki, Toshio, Yoshino, Yu, Senoo, Takehiko, Koike, Kunihiko, Aoki, Takaaki, Matsuo, Jiro

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Room Temperature Halogenation of Polyimide Film Surface using Chlorine Trifluoride Gas von Habuka, Hitoshi, Kosuga, Takahiro, Koike, Kunihiko, Aida, Toshihiro, Takeuchi, Takashi, Aihara, Masahiko

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