Hepatitis C Virus Nonstructural Protein 5A Inhibits Tumor Necrosis Factor–α–Mediated Apoptosis in Huh7 Cells von Miyasaka, Yuka, Enomoto, Nobuyuki, Kurosaki, Masayuki, Sakamoto, Naoya, Kanazawa, Nobuhiko, Kohashi, Takahiro, Ueda, Eri, Maekawa, Shinya, Watanabe, Hideki, Izumi, Namiki, Sato, Chifumi, Watanabe, Mamoru

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Expression of gap junction protein connexin 32 in chronic liver diseases von Yamaoka, Kazuaki, Nouchi, Toshihiko, Kohashi, Takahiro, Marumo, Fumiaki, Sato, Chifumi

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Arterial Ketone Body Ratio (AKBR) on Alcoholic Liver Disease von YAMAOKA, Kazuaki, JINN, Yasuto, OHOKA, Masaya, KOHASHI, Takahiro, TAJIRI, Kazuo, YAMANE, Michio, ISOMURA, Koji, OTSUKA, Naomi, ASANUMA, Shizuko, SATO, Chifumi

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618 Introduction of NS5A mutations enables subgenomic HCV-replicon derived from chimpanzee-infectious HC-J4 isolate to replicate efficiently in HUH-7 cells von Maekawa, Shinya, Enomoto, Nobuyuki, Sakamoto, Naoya, Kurosaki, Masayuki, Ueda, Eri, Kohashi, Takahiro, Watanabe, Hideki, Chen, Cheng-Hsin, Yamashiro, Tsuyoshi, Tanabe, Yoko, Kanazawa, Nobuhiko, Nakagawa, Mina, Watanabe, Mamoru

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Prompt treatment with peroral N-acetylcysteine for acute yellow phosphorus-induced liver injury: A rescued case report von YAMANE, Michio, TANAKA, Yujiro, OHNO, Tomoyuki, KOHASHI, Takahiro, TAJIRI, Kazuo, YAMAOKA, Kazuaki, TAKAMOTO, Toshihiko, OHOKA, Shinya, SATO, Chifumi

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A water-soluble, reciprocity-law-failing photoresist von Akagi, Motoo, Nonogaki, Saburo, Kohashi, Takahiro, Oba, Yoichi, Oikawa, Mitsuru, Tomita, Yoshifumi

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Azide-phenolic resin photoresists for deep UV lithography von Iwayanagi, T., Kohashi, T., Nonogaki, S., Matsuzawa, T., Douta, K., Yanazawa, H.

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Method of pattern forming in a photosensitive composition having a reciprocity law failing property von NONOGAKI, SABURO, KOHASHI, TAKAHIRO, HATANO, YOSHIO

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RADIATION SENSITIVE COMPOSITION AND PATTERNFORMATION METHOD von UENO TAKUMI, NOMOGAKI SABURO, LWAYANAGI TAKAO, KOHASHI TAKAHIRO, SHIRAISHI HIROSHI

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METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE HAVING A SELF-ALIGNED GATE ELECTRODE von UEYANAGI, KIICHI, KOHASHI, TAKAHIRO, MIYAZAKI, MASARU, TAKAHASHI, SUSUMU

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METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE von UEYANAGI, KIICHI, KOHASHI, TAKAHIRO, MIYAZAKI, MASARU, TAKAHASHI, SUSUMU

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Method of manufacturing semiconductor device utilizing multilayer mask von TAKAHASHI, SUSUMU, MIYAZAKI, MASARU, KOHASHI, TAKAHIRO, UEYANAGI, KIICHI

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RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMATION METHOD USING THE SAME von SHIRAISHI, HIROSHI, IWAYANAGI, TAKAO, NONOGAKI, SABURO, KOHASHI, TAKAHIRO, UENO, TAKUMI

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RADIATION-SENSITIVE COMPOSITION CONTAINING AN AZIDE COMPOUND AND AN IODINE COMPOUND von SHIRAISHI, HIROSHI, IWAYANAGI, TAKAO, NONOGAKI, SABURO, KOHASHI, TAKAHIRO, UENO, TAKUMI

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RADIATION-SENSITIVE COMPOSITION INCLUDING AN IODINE- CONTAINING AZIDE COMPOUND von SHIRAISHI, HIROSHI, IWAYANAGI, TAKAO, NONOGAKI, SABURO, KOHASHI, TAKAHIRO, UENO, TAKUMI

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Pattern formation method utilizing deep UV radiation and bisazide composition von HATANO, YOSHIO, IWAYANAGI, TAKAO, NONOGAKI, SABURO, KOHASHI, TAKAHIRO

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Pattern-formation method with iodine containing azide and oxygen plasma etching of substrate von UENO, TAKUMI, IWAYANAGI, TAKAO, NONOGAKI, SABURO, KOHASHI, TAKAHIRO, SHIRAISHI, HIROSHI

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Method of manufacturing a semiconductor device having a self-aligned gate electrode von UEYANAGI, KIICHI, KOHASHI, TAKAHIRO, MIYAZAKI, MASARU, TAKAHASHI, SUSUMU

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Radiation-sensitive composition and pattern-formation method using the same von SHIRAISHI, HIROSHI, IWAYANAGI, TAKAO, NONOGAKI, SABURO, KOHASHI, TAKAHIRO, UENO, TAKUMI

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Light sensitive photoresist materials von HASHIMOTO, MICHIAKI, NONOGAKI, SABURO, KOHASHI, TAKAHIRO, HATANO, YOSHIO

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