Quantitative analysis of ionization rates of depositing particles in reactive plasma deposition using mass-energy analyzer and Langmuir probe von Kitami, Hisashi, Miyashita, Masaru, Sakemi, Toshiyuki, Aoki, Yasushi, Kato, Takanori

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Numerical Simulation for Enhancement of H− Production in the DC Arc-Discharge Hydrogen Negative Ion Source for Medical Use von YAMADA, Shota, KITAMI, Hisashi, NOMURA, Shinji, AOKI, Yasushi, HOSHINO, Kazuo, HATAYAMA, Akiyoshi

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Tailoring of carrier concentration and engineering of band gap for Sn-doped In2O3 films by postirradiation of negatively charged oxygen ions von Furubayashi, Yutaka, Maehara, Makoto, Kitami, Hisashi, Sakemi, Toshiyuki, Yamamoto, Tetsuya

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Tailoring of carrier concentration and engineering of band gap for Sn-doped In 2 O 3 films by postirradiation of negatively charged oxygen ions von Furubayashi, Yutaka, Maehara, Makoto, Kitami, Hisashi, Sakemi, Toshiyuki, Yamamoto, Tetsuya

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Reactive Plasma Deposition with DC Arc Discharge von YAMAMOTO, Tetsuya, KITAMI, Hisashi, MAEHARA, Makoto, OKADA, Yugo, KINOSHITA, Kimio

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Evolution of implicate order from amorphous to polycrystalline Sn-doped In2O3 films determined by in situ two-dimensional X-ray diffraction measurements von Furubayashi, Yutaka, Kobayashi, Shintaro, Maehara, Makoto, Ishikawa, Kazuhiko, Inaba, Katsuhiko, Sakemi, Toshiyuki, Kitami, Hisashi, Yamamoto, Tetsuya

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Evolution of implicate order from amorphous to polycrystalline Sn-doped In 2 O 3 films determined by in situ two-dimensional X-ray diffraction measurements von Furubayashi, Yutaka, Kobayashi, Shintaro, Maehara, Makoto, Ishikawa, Kazuhiko, Inaba, Katsuhiko, Sakemi, Toshiyuki, Kitami, Hisashi, Yamamoto, Tetsuya

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High-Hall-mobility amorphous tin-doped In2O3 films of thicknesses of less than 50 nm von Furubayashi, Yutaka, Kitami, Hisashi, Sakemi, Toshiyuki, Kinoshita, Kimio, Maehara, Makoto, Makino, Hisao, Yamamoto, Tetsuya

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Anomalous carrier transport of tin-doped In2O3 thin films irradiated with negative oxygen ions von Furubayashi, Yutaka, Kitami, Hisashi, Sakemi, Toshiyuki, Kinoshita, Kimio, Maehara, Makoto, Makino, Hisao, Yamamoto, Tetsuya

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New evaluation of degenerate/non-degenerate states and novel bandagp engineering of Sn-doped In2O3 films by postirradaition of O- ions von Furubayashi, Yutaka, Maehara, Makoto, Sakemi, Toshiyuki, Kitami, Hisashi, Yamamoto, Tetsuya

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Transformation from degenerate to non-degenerate Sn-doped In2O3 films by postirradaition of O- ions von Furubayashi, Yutaka, Maehara, Makoto, Sakemi, Toshiyuki, Kitami, Hisashi, Yamamoto, Tetsuya

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Origin of high Hall mobility of W-doped In2O3 films von Furubayashi, Yutaka, Maehara, Makoto, Sakemi, Toshiyuki, Kitami, Hisashi, Yamamoto, Tetsuya

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Dominant factors limiting carrier transport of ultra thin W-doped In2O3 films von Furubayashi, Yutaka, Maehara, Makoto, Sakemi, Toshiyuki, Kitami, Hisashi, Yamamoto, Tetsuya

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Design of Advanced Functional ZnO Conductive Thin Films with Arc Plasma von YAMAMOTO, Tetsuya, NOMOTO, Junichi, KITAMI, Hisashi, SAKEMI, Toshiyuki, MAKINO, Hisao, KOBAYASHI, Keisuke, AOKI, Yasushi, KISHIMOTO, Seiichi

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Widening of harvesting layer and area of P3HT/PCBM bulk-heterojunction photovoltaic cells von Kitami, Hisashi, Sakai, Takaaki, Hishinuma, Takaaki, Sanda, Atsushi, Kusano, Hiroyuki, Kitagawa, Masahiko

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Solar cell production method, solar cell production device, component for solar cell production, and solar cell von KITAMI, HISASHI

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SOLAR CELL PRODUCTION METHOD, SOLAR CELL PRODUCTION DEVICE, COMPONENT FOR SOLAR CELL PRODUCTION, AND SOLAR CELL von KITAMI Hisashi

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直流アーク放電反応性プラズマ蒸着法 von 山本, 哲也, 北見, 尚久, 前原, 誠, 岡田, 悠悟, 木下, 公男

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Reactive Plasma Deposition (RPD) equipment von Kinoshita, Kimio, Maehara, Makoto, Sakemi, Toshiyuki, Kitami, Hisashi

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Negative ion generating device capable of properly irradiating negative ions on object von KITAMI, HISASHI

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