Quantitation of the ROS production in plasma and radiation treatments of biotargets von Ji, Wan-Ook, Lee, Min-Ho, Kim, Gon-Ho, Kim, Eun-Hee

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Predictive control of the plasma processes in the OLED display mass production referring to the discontinuity qualifying PI-VM von Park, Seolhye, Jang, Yongsuk, Cha, Taewon, Noh, Yeongil, Choi, Younghoon, Lee, Juyoung, Seong, Jaegu, Kim, Byungsoo, Cho, Taeyoung, Park, Yoona, Seo, Rabul, Yang, Jae-Ho, Kim, Gon-Ho

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Micro-range uniformity control of the etching profile in the OLED display mass production referring to the PI-VM model von Park, Seolhye, Seong, Jaegu, Noh, Yeongil, Park, Yoona, Jang, Yongsuk, Cho, Taeyoung, Yang, Jae-Ho, Kim, Gon-Ho

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2022 Review of Data-Driven Plasma Science von Anirudh, Rushil, Archibald, Rick, Asif, M. Salman, Becker, Markus M., Benkadda, Sadruddin, Bremer, Peer-Timo, Bude, Rick H. S., Chang, C. S., Chen, Lei, Churchill, R. M., Citrin, Jonathan, Gaffney, Jim A., Gainaru, Ana, Gekelman, Walter, Gibbs, Tom, Hamaguchi, Satoshi, Hill, Christian, Humbird, Kelli, Jalas, Soren, Kawaguchi, Satoru, Kim, Gon-Ho, Kirchen, Manuel, Klasky, Scott, Kline, John L., Krushelnick, Karl, Kustowski, Bogdan, Lapenta, Giovanni, Li, Wenting, Ma, Tammy, Mason, Nigel J., Mesbah, Ali, Michoski, Craig, Munson, Todd, Murakami, Izumi, Najm, Habib N., Olofsson, K. Erik J., Park, Seolhye, Peterson, J. Luc, Probst, Michael, Pugmire, David, Sammuli, Brian, Sawlani, Kapil, Scheinker, Alexander, Schissel, David P., Shalloo, Rob J., Shinagawa, Jun, Seong, Jaegu, Spears, Brian K., Tennyson, Jonathan, Thiagarajan, Jayaraman, Ticos, Catalin M., Trieschmann, Jan, van Dijk, Jan, Van Essen, Brian, Ventzek, Peter, Wang, Haimin, Wang, Jason T. L., Wang, Zhehui, Wende, Kristian, Xu, Xueqiao, Yamada, Hiroshi, Yokoyama, Tatsuya, Zhang, Xinhua

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Development of model predictive control of fluorine density in SF6/O2/Ar etch plasma by oxygen flow rate von Ryu, Sangwon, Kwon, Ji-Won, Park, Jihoon, Lee, Ingyu, Park, Seolhye, Kim, Gon-Ho

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Development of the Virtual Metrology for the Nitride Thickness in Multi-Layer Plasma-Enhanced Chemical Vapor Deposition Using Plasma-Information Variables von Roh, Hyun-Joon, Ryu, Sangwon, Jang, Yunchang, Kim, Nam-Kyun, Jin, Younggil, Park, Seolhye, Kim, Gon-Ho

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Global model analysis of negative ion generation in low-pressure inductively coupled hydrogen plasmas with bi-Maxwellian electron energy distributions von Huh, Sung-Ryul, Kim, Nam-Kyun, Jung, Bong-Ki, Chung, Kyoung-Jae, Hwang, Yong-Seok, Kim, Gon-Ho

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Cause analysis of the faults in HARC etching processes by using the PI‐VM model for OLED display manufacturing von Park, Seolhye, Kyung, Yunyoung, Lee, Juyoung, Jang, Yongsuk, Cha, Taewon, Noh, Yeongil, Choi, Younghoon, Kim, Byungsoo, Cho, Taeyoung, Seo, Rabul, Yang, Jae‐Ho, Jang, Yunchang, Ryu, Sangwon, Kim, Gon‐Ho

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Phenomenology-based model predictive control of electron density in Ar/SF6 capacitively coupled etch plasma von Ryu, Sangwon, Kwon, Ji-Won, Lee, Ingyu, Park, Jihoon, Kim, Gon-Ho

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Plasma information-based virtual metrology (PI-VM) and mass production process control von Park, Seolhye, Seong, Jaegu, Jang, Yunchang, Roh, Hyun-Joon, Kwon, Ji-Won, Lee, Jinyoung, Ryu, Sangwon, Song, Jaemin, Roh, Ki-Baek, Noh, Yeongil, Park, Yoona, Jang, Yongsuk, Cho, Taeyoung, Yang, Jae-Ho, Kim, Gon-Ho

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Population Kinetics Modeling of Low-Temperature Argon Plasma von Chung, Hyun-Kyung, Song, Mi-Young, Kwon, Ji-Won, Lee, Myeong-Geon, Park, Jihoon, Bae, Namjae, Song, Jeamin, Kim, Gon-Ho, Dipti, Ralchenko, Yuri

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Enhancement of the Virtual Metrology Performance for Plasma-Assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters von Park, Seolhye, Jeong, Sangmin, Jang, Yunchang, Ryu, Sangwon, Roh, Hyun-Joon, Kim, Gon-Ho

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Simulations of fusion edge plasmas by linear plasma devices: physics and plasma–material interactions von Kang, In Je, Bae, Min-Keun, Park, In Sun, Woo, Hyun-Jong, Lho, Taihyeop, Ahn, Jeong-Sun, Chang, Doo-Hee, Cho, Soon-Gook, Choi, Geun-Sik, Choi, Heung-Gyun, Choi, Yong-Sup, Chung, Bo-Hyun, Chung, Tae Hun, Do, Jeong-Joon, Goo, Bon-Cheol, Hong, Sung Hoon, Hong, Suk-Ho, Jeon, Jong-Sik, Joo, Sung-Kiu, Jung, Seo Jin, Jung, Seok-Won, Jung, Young-Dae, Jung, Yong Ho, Ko, Kwang-Cheol, Kim, Beom-Sik, Kim, Gon-Ho, Kim, Hye-Ran, Kim, Heung-Su, Kim, Jin-Hee, Kim, Jong-Il, Kim, Jae Yong, Kim, Kyung-Cheol, Kim, Myung Kyu, Kim, Sang-You, Kim, Jin-Woo, Kim, Yong-Kyun, Kwak, Gyea Young, Lee, Dong-Han, Lee, Heon-Ju, Lee, Min Ji, Lee, Myoung-Jae, Lee, Seung-Hwa, Park, Eun-Kyung, Seok, Dong Chan, Lee, Byoung-Kyu, Noh, Seung Jeong, Seo, Young-Jun, Shim, Yun-Keun, Sun, Jong Ho, Oh, Byung-Hoon, Oh, Cha-Hwan, Oh, Hye Taek, Oh, Young-Suk, Park, Sang Joon, You, Hyun Jong, You, Hun Suk, Chung, Kyu-Sun

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Development of plasma sources and diagnostics for the simulation of fusion edge plasmas von Woo, Hyun-Jong, Park, In Sun, Kang, In Je, Cho, Soon-Gook, Choi, Yong-Sup, Ahn, Jeong-Sun, Bae, Min-Keun, Chang, Doo-Hee, Choi, Geun-Sik, Choi, Heung-Gyun, Chung, Bo-Hyun, Chung, Tae Hoon, Do, Jeong-Joon, Goo, Bon-Cheol, Hong, Sung Hoon, Hong, Suk-Ho, Jeon, Jong-Sik, Joo, Sung-Kiu, Jung, Seo Jin, Jung, Seok-Won, Jung, Young-Dae, Jung, Yong Ho, Ko, Kwang-Cheol, Kim, Beom-Sik, Kim, Gon-Ho, Kim, Hye-Ran, Kim, Heung-Su, Kim, Jin-Hee, Kim, Jong-Il, Kim, Jae Yong, Kim, Kyung-Cheol, Kim, Myung Kyu, Kim, Sang-You, Kim, Jin-Woo, Kim, Yong-Kyun, Kwak, Gyea Young, Lee, Dong-Han, Lee, Heon-Ju, Lee, Min Ji, Lee, Myoung-Jae, Lee, Seung-Hwa, Lho, Taihyeop, Park, Eun-Kyung, Seok, Dong Chan, Lee, Byoung-Kyu, Noh, Seung Jeong, Seo, Young-Jun, Shim, Yun-Keun, Sun, Jong Ho, Oh, Byung-Hoon, Oh, Cha-Hwan, Oh, Hye Taek, Oh, Young-Suk, Park, Sang Joon, You, Hyun-Jong, Yoo, Hunsuk, Chung, Kyu-Sun

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Sparse Bayesian long short-term memory networks for computationally efficient stochastic modeling of plasma etch processes von Park, Damdae, Ryu, Sangwon, Kim, Gon-Ho, Lee, Jong Min

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Observation of the floating sheath distribution on Al2O3 and silicon targets adjacent to a DC biased metal substrate von Bae, Namjae, Kim, Nam-Kyun, Lee, Haneul, Jang, Yunchang, Park, Seolhye, Kim, Gon-Ho

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High-temperature thermo-mechanical behavior of functionally graded materials produced by plasma sprayed coating: Experimental and modeling results von Choi, Kang Hyun, Kim, Hyun-Su, Park, Chang Hyun, Kim, Gon-Ho, Baik, Kyoung Ho, Lee, Sung Ho, Kim, Taehyung, Kim, Hyoung Seop

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Numerical Analysis on the Electrical and Thermal Flow Characteristics of Ar-N2 Inductively Coupled Plasma Torch System von Nam, Jun-Seok, Lee, Mi-Yeon, Seo, Jun-Ho, Kim, Gon-Ho

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Competitive roles of dislocations on blister formation in polycrystalline pure tungsten von Oh, Yeonju, Min, Guensik, Roh, Ki-Baek, Kim, Hwangsun, Kim, Hyoung Chan, Kim, Gon-Ho, Han, Heung Nam

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Effect of yttrium doping in tungsten on sinterability and properties as a plasma-facing material von Min, Guensik, Oh, Yeonju, Kim, Hwangsun, Shin, Eunjoo, Roh, Ki-Baek, Kim, Jeongseok, Kwak, Nojun, Kim, Yanghoo, Kim, Hyoung Chan, Kim, Gon-Ho, Han, Heung Nam

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